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Power converter unit, plasma processing equipment and method of controlling several plasma processes

A technology of power converter and plasma, which is applied in the direction of output power conversion device, conversion of DC power input to DC power output, conversion of AC power input to AC power output, etc., which can solve problems such as high installation cost and excess installation power

Active Publication Date: 2020-02-04
TRUMPF HUETTINGER
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This excess installed power can lead to high installation costs

Method used

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  • Power converter unit, plasma processing equipment and method of controlling several plasma processes
  • Power converter unit, plasma processing equipment and method of controlling several plasma processes
  • Power converter unit, plasma processing equipment and method of controlling several plasma processes

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Embodiment Construction

[0059] exist figure 1 In , a first plasma processing apparatus 19 with a first power converter unit 1 is shown. The plasma processing apparatus 19 includes plasma processing chambers 9a, 9b, . . . , 9n. Each plasma processing chamber is connected to a power output port 3a, 3b, ..., 3n.

[0060] The power converter unit 1 comprises a power input port 2 for connection to a power transmission grid 7 .

[0061] The power converter unit 1 also comprises a first power converter stage 5 configured to be able to convert the input power at the input power port 2 into intermediate power, preferably into DC link power 12 . Furthermore, a plurality of first power converter stages 5 configured to be able to convert the input power at the input power port 2 to intermediate power, preferably to DC link power 12, may be part of the power converter unit 1 and preferably connected in parallel.

[0062] The power converter unit 1 also comprises a further power converter stage 6 connected dow...

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PUM

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Abstract

A power converter unit (1, 1') capable of converting an electrical input power into a bipolar output power and to deliver this output power to at least two independent plasma processing chambers (9a,9b,... 9n). The unit (1, 1') comprises: one power input port (2) for connection to an electrical power delivering grid (7); at least two, preferably more than two, power output ports (3a, 3b,... 3n) each for connection to one of the plasma process chambers (9a, 9b,... 9n); a control device (4) configured to control the unit (1, 1') to deliver the bipolar output power to the power output ports (3a,3b,... 3n), using control parameters of at least one of: power, voltage, current, excitation frequency, or threshold for protective measures. The control device (4) comprises a virtual power supply (24a, 24b,... 24n) for every output port (3a, 3b,... 3n), every virtual power supply (24a, 24b,... 24n) comprising a separate complete set of all fixed and time varying parameters and internal states associated with the operation of every individual output port (3a, 3b,... 3n) is kept in the control device (4).

Description

technical field [0001] The invention relates to a power converter unit, a plasma processing apparatus and a method of controlling a plurality of plasma processes. Background technique [0002] Many plasma processing facilities employ multiple independent plasma processing chambers in which plasma processing is performed in parallel. Such plasma treatment devices are known from US 2014 / 0357064 A1, US 2006 / 0156979 A1, US 2005 / 0034667 A1, US 7,396,759 B1, US 6,756,318 B2, US 6,495,392 B2, US 6,271,053 B1. To this end, these devices employ multiple independent power sources connected to the various chambers. In many cases, the power delivered to all chambers is always less than the sum of the rated power installed on the machine through all the individual power sources. This excess installed power leads to high installation costs. Contents of the invention [0003] It is an object of the invention to reduce excess costs. [0004] Said object is solved by a power converter ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J37/32C23C14/34H01J37/34H02J3/36H02M7/00
CPCH02M7/06H02M7/5387H01J37/32889H01J37/32899H01J2237/3321H01J2237/332H01J2237/334H01J37/34H02J3/36H02M1/32H02M5/458C23C16/50Y02E60/60H02M1/0003H02M1/008C23C14/54C23C16/52H02M3/33569
Inventor J·P·恩格尔施泰特K·鲁达J·斯维亚特尼基
Owner TRUMPF HUETTINGER