Detection platform

Abstract

The invention discloses a detection platform which comprises a base station and a mobile detection device arranged on the base station. The mobile detection device comprises a detection rack and a plurality of linear modules arranged on the detection rack; the base table comprises a base station frame and a correcting mechanism, a correcting reference mechanism, a corner detection mechanism and aplane compensation mechanism which are arranged on the base station. The detection platform has two processes of initial positioning and accurate positioning and has high positioning precision and candetect the straightness error, the perpendicularity error and the planeness error of the flat plate simultaneously and fills the technical blank of planeness error detection of large-size and ultrathin flat plates and can be widely applied to the field of planeness error detection of various large-size plates.

Description

technical field [0001] The invention relates to the technical field of flatness detection, in particular to a detection platform. Background technique [0002] With the development of modern science and technology, the demand for various flat panels in industry is increasing, and the requirements for them are also getting higher and higher, especially in the field of liquid crystal display manufacturing. The manufacture of glass substrates puts forward higher requirements. In terms of performance, the manufacturing process of high-performance displays often includes multiple precision photolithography, which requires high processing accuracy for the substrate dimensions, the most important of which is for The requirements of substrate flatness error and thickness are extremely important. For example, if the accuracy of the second substrate of active LCD cannot be guaranteed, then the formed pool space, that is, the distance between the two substrates, will produce errors, wh...

AI Technical Summary

Problems solved by technology

[0002] With the development of modern science and technology, the demand for various flat panels in industry is increasing, and the requirements for them are also getting higher and higher, especially in the field of liquid crystal display manufacturing. The manufacture of glass substrates puts forward higher requirements. In terms of performance, the manufacturing process of high-performance displays often includes multiple precision photolithography, which requires high processing accuracy for the substrate dimensions, the most important of which is for The requirements of substrate flatness error and thickness are extremely important. For example, if the accuracy of the second substrate of active LCD cannot be guaranteed, then the formed pool space, that is, the distance between the two substrates, will produce errors, which directly affect the electric field and Pixels make the grayscale and color of the display uneven, and it also brings many problems in the photolithography process for substrates with low flatness. It cannot be focused on the entire plane during exposure, which will cause various problems in the internal microcircuits. question

[0003] Based on the above phenomenon, there are mainly methods such as the level meter method, the autocollimator method, the optical axis method, and the liquid level method for the flatness detection of the flat plate, but these methods cannot meet the large size and ultra-thin glass flatness error. Therefore, it is an urgent problem for those skilled in the art to design a device for large-scale and automatic detection of flatness errors of large-sized and ultra-thin flat plates in batches.

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