Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A mask cleaning device

A cleaning device and mask technology, which is applied in the direction of using liquid cleaning methods, cleaning methods and utensils, chemical instruments and methods, etc., can solve the problems that affect the use, and the masks with holes are not easy to be cleaned thoroughly. To achieve the effect of good cleaning, fast and effective cleaning, and thorough cleaning

Active Publication Date: 2022-01-04
天津智安微电子技术有限公司
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Most of the existing cleaning devices use immersion cleaning when cleaning the mask. This cleaning method is not easy to clean the mask with holes, which will affect the subsequent use.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A mask cleaning device
  • A mask cleaning device
  • A mask cleaning device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040]A cleaning device for a mask plate, comprising a fixing base 1, a cleaning tank 2 is fixedly arranged on the fixing base 1, a cleaning frame 3 is arranged in the cleaning tank 2, and a plurality of groups of insertion grooves 301 are arranged in the cleaning frame 3 for inserting A mask plate is provided, wherein the mask plate is inserted into the insertion slot 301 formed by the two adjacent limit blocks, and the bottom of the cleaning frame 3 is clamped and fixed with the cleaning tank 2 through the fixed support 4; the cleaning frame 3 can be The frame cover 5 is disassembled and fixed, and the center of the frame cover 5 is fixedly connected with a connecting shaft 6, and the top of the connecting shaft 6 is connected with a top plate 8 through a bearing 7, and a servo motor is fixedly installed on the top plate 8 as the power to drive the connecting shaft 6 to rotate. In the device 9 , the output shaft of the servo motor is fixedly connected to the connecting shaft ...

Embodiment 2

[0054] A cleaning device for a mask plate, comprising a fixing base 1, a cleaning tank 2 is fixedly arranged on the fixing base 1, a cleaning frame 3 is arranged in the cleaning tank 2, and a plurality of groups of insertion grooves 301 are arranged in the cleaning frame 3 for inserting A mask plate is set, the bottom of the cleaning frame 3 is clamped and fixed with the cleaning tank 2 through the fixed support 4; the cleaning frame 3 is detachably installed and fixed with a frame cover 5, and the center of the frame cover 5 is fixedly connected with a connecting shaft 6, and the connecting shaft 6 The top is rotatably connected with a top plate 8 through a bearing 7, and a servo motor is fixedly installed on the top plate 8 as a power device 9 that drives the connecting shaft 6 to rotate. The output shaft of the servo motor is fixedly connected with the connecting shaft 6 through a shaft sleeve; A lifting device 10 is installed, and the top of the lifting device 10 is clamped...

Embodiment 3

[0069] A cleaning device for a mask plate, comprising a fixing base 1, a cleaning tank 2 is fixedly arranged on the fixing base 1, a cleaning frame 3 is arranged in the cleaning tank 2, and a plurality of groups of insertion grooves 301 are arranged in the cleaning frame 3 for inserting A mask plate is set, the bottom of the cleaning frame 3 is clamped and fixed with the cleaning tank 2 through the fixed support 4; the cleaning frame 3 is detachably installed and fixed with a frame cover 5, and the center of the frame cover 5 is fixedly connected with a connecting shaft 6, and the connecting shaft 6 The top is rotatably connected with a top plate 8 through a bearing 7, and a servo motor is fixedly installed on the top plate 8 as a power device 9 that drives the connecting shaft 6 to rotate. The output shaft of the servo motor is fixedly connected with the connecting shaft 6 through a shaft sleeve; A lifting device 10 is installed, and the top of the lifting device 10 is clamped...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a mask cleaning device, which includes a fixing seat, a cleaning tank is fixedly arranged on the fixing seat, a cleaning frame is arranged in the cleaning tank, and several groups of socket slots are arranged in the cleaning frame. When the mask plate is inserted, the bottom of the cleaning frame is clamped and fixed with the cleaning tank through the fixed support; the cleaning frame is detachably installed and fixed with a frame cover, and the center of the frame cover is fixedly connected with a connecting shaft. The top of the shaft is rotatably connected to a top plate through a bearing, and a power device that drives the connecting shaft to rotate is arranged on the top plate; a lifting device is also fixedly installed on the fixed base, and the top of the lifting device snaps to the top plate. The masks cleaned by the cleaning device of the present invention are easy to operate and thoroughly cleaned.

Description

technical field [0001] The invention belongs to the field of mask plate processing equipment, and in particular relates to a mask plate cleaning device. Background technique [0002] With the rapid development of the modern electronics industry, the processing technology of mobile phone backplane textures, flat panel displays, and micro-nano structures of integrated circuit boards is becoming more and more critical, and mask exposure is one of them. The mask plate used in mask plate exposure is usually coated with a layer of chromium on quartz glass, and the required pattern is produced by exposure etching process. The exposure experiment cannot be carried out after the mask plate is dirty, otherwise the dirty imprint on it will be transferred to the photoresist plate without reservation. Therefore, the cleaning of the dirty mask is very important. [0003] Most of the existing cleaning devices use immersion cleaning when cleaning the mask. This cleaning method is not easy...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/08B08B3/10B08B3/12B08B13/00B08B7/00
CPCB08B3/08B08B3/10B08B3/123B08B13/00B08B7/00
Inventor 张国辉王彩霞
Owner 天津智安微电子技术有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com