Multifunctional quartz carrier for photoetching and processing technology thereof
A multifunctional, quartz technology, applied in the field of quartz, can solve problems such as the inability to realize automatic overflow and exhaust, many times of annealing of the overall structure, and poor welding stability of the cylinder body, so as to improve technical requirements and capacity requirements, liquid flow Uniformity, increase the effect of temperature measurement function
Pending Publication Date: 2020-05-08
北京凯德石英股份有限公司
View PDF0 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
[0002] The existing quartz cylinder has a single-layer cylinder structure, which cannot realize automatic overflow and exhaust. The original cylinder has poor welding stability and high damage rate. The stress generated during processing cannot be removed, and the overall structure has many annealing times. , the cleaning process is cumbersome
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0039] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only some of the embodiments of the present invention, not all of them. Based on The embodiments of the present invention and all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0040] Such as Figure 1-5 As shown, a multifunctional quartz carrier for lithography, the quartz carrier includes an inner cylinder and an outer cylinder, the inner cylinder and the outer cylinder are fixed and welded as one, the size of the inner cylinder is smaller than that of the outer cylinder, and the distance between the inner cylinder and the outer cylinder is A closed interlayer is formed between them. The inner cylinder includes a fir...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention discloses a processing technology of a multifunctional quartz carrier for photoetching. The quartz carrier comprises an inner cylinder and an outer cylinder, and the inner cylinder and the outer cylinder are fixedly welded into a whole; the inner cylinder is smaller than the outer cylinder; a closed interlayer is formed between the inner cylinder and the outer cylinder; the inner cylinder comprises a first inner side plate, a second inner side plate, a third inner side plate, a fourth inner side plate and an inner bottom plate; the first inner side plate, the second inner side plate, the third inner side plate, the fourth inner side plate and the inner bottom plate are fixedly welded into a whole; and the outer cylinder comprises two first outer side plates, a second outer side plate, a third outer side plate and an outer bottom plate, and the two first outer side plates, the second outer side plate, the third outer side plate and the outer bottom plate are fixedly weldedinto a whole.
Description
technical field [0001] The invention relates to the technical field of quartz, in particular to a multifunctional quartz carrier for photolithography and a processing technology thereof. Background technique [0002] The existing quartz cylinder has a single-layer cylinder structure, which cannot realize automatic overflow and exhaust. The original cylinder has poor welding stability and high damage rate. The stress generated during processing cannot be removed, and the overall structure has many annealing times. , The cleaning process is cumbersome. For this reason, the present application specially designed a new multifunctional quartz carrier for photolithography according to the needs. Contents of the invention [0003] The object of the present invention is to provide a multifunctional quartz carrier for photolithography and its processing technology, so as to solve the problems raised in the above-mentioned background technology. [0004] The purpose of the present...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/673C03B20/00
CPCC03B20/00H01L21/67306
Inventor 张忠恕王连连赵鹤陈强于洋冯继瑶张娟边占宁孙云涛李宝军张连兴王建立
Owner 北京凯德石英股份有限公司