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Silver thin film etching liquid composition, etching method, and method for forming metal pattern

A technology of etching solution and composition, applied in the field of silver thin film etching solution composition, can solve the problems of difficult to ensure the straightness of etching pattern, poor process, re-adsorption of silver particles, etc., to maintain etching performance, improve etching efficiency, control The effect of etching speed

Active Publication Date: 2020-05-19
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

When conventional etchant is used as such etchant, silver (Ag) will be etched excessively or unevenly, causing wiring to rise or peel off, and the side profile of wiring will be defective.
[0007] In addition, low skew (LOW skew) display for high resolution is difficult from the process point of view
[0008] In particular, silver (Ag) is a metal that is easily reduced. Only when the etching speed is fast can it be etched without residue induction. At this time, due to the fast etching speed, the upper and lower There is no difference in etching speed between parts, it is difficult to form a taper angle after etching, and it is difficult to ensure the straightness of the etchi

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  • Silver thin film etching liquid composition, etching method, and method for forming metal pattern
  • Silver thin film etching liquid composition, etching method, and method for forming metal pattern
  • Silver thin film etching liquid composition, etching method, and method for forming metal pattern

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Abstract

The present invention provides a silver thin film etching liquid composition, an etching method, and a method for forming a metal pattern. The silver thin film etching liquid composition comprises (A)nitric acid; (B-1) alkyl sulfonic acid; (B-2) an organic acid other than alkyl sulfonic acid; (C) at least one of a metal, a metal salt and sulfuric acid; (D) sulfate; and (E) water. The present invention provides an effect of significantly improving silver resorption problems and residues (e.g., silver residues and/or transparent conductive film residues, etc.).

Description

technical field [0001] The present invention relates to a silver thin film etchant composition, an etching method using the silver thin film etchant composition, and a method for forming a metal pattern. Background technique [0002] With the real step into the information age, the display field for processing and displaying a large amount of information develops rapidly, and a large number of flat panel displays have been developed and attracted attention. [0003] Examples of such flat panel display devices include liquid crystal display devices (Liquid crystal display device: LCD), plasma display devices (Plasma Display Panel device: PDP), field emission display devices (Field Emission Display device: FED), electric Electroluminescence display device (ELD), organic light emitting display (Organic Light Emitting Diodes: OLED), etc., such flat-panel display devices are not only used in home appliances such as TVs and video recorders, but also used in notebooks for various p...

Claims

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Application Information

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IPC IPC(8): C23F1/30C23F1/02C09K13/06H01L21/306
CPCC23F1/30C23F1/02C09K13/06H01L21/30604
Inventor 金炼卓金镇成南基龙刘仁浩
Owner DONGWOO FINE CHEM CO LTD