Device and method for preventing grinding fluid from precipitating

Abstract

The invention discloses a device for preventing grinding fluid from precipitating. The device comprises a grinding fluid supply pipeline connected between a grinding fluid supply system and a chemicalmechanical grinding machine table; a return outlet is formed in the grinding liquid supply pipeline close to one side of the chemical mechanical grinding machine table; a grinding fluid return pipeline is arranged between the grinding fluid supply system and the return outlet; a rotatable structure is arranged on the grinding fluid supply pipeline, a rotating device is arranged on the grinding fluid supply pipeline, and the rotating device rotates the grinding fluid supply pipeline before the number of solidified particles formed by precipitation or crystallization in the grinding fluid supply pipeline reaches a set value, and condensate particles formed by precipitation or crystallization in the grinding fluid supply pipeline are removed. The invention further discloses a method for preventing the grinding fluid from precipitating. According to the device and method, excessive condensate particles can be prevented from being precipitated or crystallized in the grinding fluid supply pipeline, so that the probability of scratch defects on the surface of a wafer can be reduced.

Description

technical field [0001] The invention relates to the field of semiconductor integrated circuit manufacturing, in particular to a device for preventing grinding fluid from settling. The present invention also relates to a method for preventing precipitation of grinding liquid. Background technique [0002] Such as figure 1 As shown, it is a schematic structural view of the existing grinding liquid supply pipeline; the grinding liquid supply pipeline 103 of the existing chemical mechanical grinding machine table 102 is connected to the grinding liquid supply between the grinding liquid supply system 101 and the chemical mechanical grinding machine table 102 pipeline 103 . [0003] The slurry supply system 101 is a local or central slurry supply system (Local / CentralSupply). [0004] A return outlet is provided on the polishing liquid supply pipeline 103 near the chemical mechanical polishing machine table 102 . [0005] The grinding liquid return pipeline 104 is arranged be...

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Problems solved by technology

[0007] figure 1 The existing grinding liquid supply pipeline 103 shown is limited by the length of the grinding liquid supply pipeline 103 and the utilization rate of the grinding liquid. If the grinding liquid supply pipeline 103 in the system is long or the grinding liquid usage rate is not high enough, it is easy to cause the grinding liquid Precipitation or crystallization of solidified particles in the medium, especially cerium oxide, a slurry with a high solidified content

After a lot of solidified particles in the grinding liquid are deposited, they are easily impacted into the internal pipeline of the machine 102. In this case, even if a filter is installed in the main pipeline, it cannot guarantee that some of the precipitated particles and crystals will be brought to the machine. 102 In the internal pipeline, the defects that eventually cause these particles or crystals to contact the surface of the wafer to cause scratches affect the yield

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