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Positioning device in wafer cleaning equipment

A technology for cleaning equipment and positioning devices, which is applied in the manufacturing of electrical components, circuits, semiconductor/solid-state devices, etc.

Active Publication Date: 2020-06-05
BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the present invention is to provide a positioning device in wafer cleaning equipment, to relieve the existing positioning device in wafer cleaning equipment, when the manipulator When the error between the movement path and the horizontal position of the wafer support mechanism gradually increases, the manipulator will not be able to move exactly above the wafer support mechanism, and it is troublesome to measure and calibrate the manipulator again.

Method used

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  • Positioning device in wafer cleaning equipment
  • Positioning device in wafer cleaning equipment
  • Positioning device in wafer cleaning equipment

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Embodiment Construction

[0028] The technical solutions of the present invention will be clearly and completely described below in conjunction with the embodiments. Obviously, the described embodiments are part of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0029] Such as Figure 1-Figure 4 As shown, the embodiment of the present invention provides the positioning device in the wafer cleaning equipment, including: a connection assembly and a wafer support mechanism, the wafer support mechanism is located in the cleaning tank, the cleaning liquid is contained in the cleaning tank, and the wafer 500 is supported on the wafer support mechanism. The connection assembly is used to connect the wafer support mechanism in the cleaning tank. And the wafer support mechanism is mova...

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Abstract

The invention provides a positioning device in wafer cleaning equipment, and relates to the technical field of wafer cleaning. The positioning device in the wafer cleaning equipment comprises a connecting assembly and a wafer supporting mechanism. The connecting assembly is used for connecting the wafer supporting mechanism in a cleaning tank; and the wafer supporting mechanism is movably connected with the connecting assembly, so that the horizontal position of the wafer supporting mechanism in the cleaning tank is adjustable. The wafer supporting mechanism can be adjusted in position in thehorizontal direction relative to the cleaning tank so as to be in accurate butt joint with a mechanical arm. Frequent programming processing does not need to be conducted on the mechanical arm, and the efficiency of reducing errors is improved.

Description

technical field [0001] The present invention relates to the technical field of wafer cleaning equipment, in particular to a positioning device in wafer cleaning equipment. Background technique [0002] The current wet cleaning of wafers can be divided into three methods: multi-tank cleaning, spin washing (drying) and single-wafer corrosion cleaning. Continuous upgrading and improvement, tank cleaning plays an important role in wet cleaning. [0003] In order to meet the requirements of high cleanliness on the wafer surface in the wafer processing process, the wet chemical cleaning equipment has developed a cassetteless cleaning process. Compared with the traditional cassette cleaning, the wafer-less cassette cleaning is not blocked by the cassette during the cleaning process, and the cleaning effect has been greatly improved. [0004] However, in the existing waferless cassette, the wafer support mechanism is fixed in the cleaning tank, and the manipulator for transferring...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67H01L21/68
CPCH01L21/67057H01L21/68Y02P70/50
Inventor 秦亚奇吴娖祝福生吴光庆安稳鹏
Owner BEIJING SEMICON EQUIP INST THE 45TH RES INST OF CETC