Easy-to-tear knife and ironing block integrated rear transverse sealing ironing block mechanism and transverse sealing device
An easy-to-tear, integrated technology, applied in packaging, transport packaging, transportation and packaging, etc., can solve the deviation between the position of the cutout and the relative position of the horizontal seal, difficulty in ensuring quality stability, and deviation of the position of the easy-to-tear opening and other issues to achieve the effect of reducing processes and parts, promoting miniaturized design, and ensuring stable and accurate processing
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0034] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0035] see Figure 1-Figure 10 , easy-tear knife and ironing block integrated rear horizontal sealing and ironing block mechanism, the integrated rear horizontal sealing and ironing block mechanism 100 includes rear ironing block 10, spring assembly 20, easy-tearing knife 30, rear ironing block seat 40, And rear horizontal sealing frame plat...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com