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Device and method for precise diameter expansion of aln seed crystal

A seed crystal, accurate technology, applied in post-processing devices, chemical instruments and methods, single crystal growth, etc., can solve the difficulty of radial growth of AlN crystals, the difficult period and cost of diameter expansion, and the inability to ensure that the diameter reaches the expected state, etc. problem, to achieve the effect of simple operation, improving crystal purity, and speeding up the development process

Active Publication Date: 2022-02-22
哈尔滨科友半导体产业装备与技术研究院有限公司
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  • Application Information

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Problems solved by technology

[0002] In the process of growing aluminum nitride crystals using the PVT method, because the radial growth of AlN crystals is very difficult, the diameter of AlN crystals hardly changes, and the seed crystal is very important for crystal growth, and there is no corresponding high-quality and large-sized seed crystal , It is almost impossible to grow high-quality crystals, how to use the diameter expansion method in the crystal growth process of silicon carbide (continuous iterative growth, each time increasing the diameter a little) for AlN crystal growth, diameter expansion is more difficult and cycle and cost It will far exceed the expansion of crystals such as silicon carbide, and each expansion cannot guarantee that the diameter will reach the expected state

Method used

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  • Device and method for precise diameter expansion of aln seed crystal
  • Device and method for precise diameter expansion of aln seed crystal
  • Device and method for precise diameter expansion of aln seed crystal

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specific Embodiment approach

[0034] to combine Figure 1-Figure 4 Describe this embodiment mode, an AlN seed crystal diameter expansion device and method in this embodiment mode, including a graphite heater 1, a crucible 2 and a growth assembly 3, the crucible 2 is located inside the graphite heater 1, and the growth assembly 3 is located in the crucible 2 internal;

[0035] Graphite heater 1 comprises graphite heater upper cover 1-1, graphite heater side wall 1-2, graphite heater lower cover 1-3 and graphite raw material filter sheet 1-4, graphite heater upper cover 1-1 and graphite heater The heater lower cover 1-3 is respectively connected with the upper and lower ends of the graphite heater side wall 1-2, the graphite raw material filter 1-4 is located inside the graphite heater side wall 1-2, and the graphite raw material filter 1-4 is connected to the graphite heater side wall 1-2. The heater side wall 1-2 is connected, and the graphite raw material filter 1-4 can support the crucible 2;

[0036] ...

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Abstract

The invention relates to a device and method for accurately expanding the diameter of an AlN seed crystal, belonging to the field of crystal growth. The operation is simple and the efficiency is high, and AlN crystals of corresponding sizes can be produced according to needs. The device for accurately expanding the diameter of the AlN seed crystal includes a graphite heater, a crucible and a growth assembly. The crucible is located inside the graphite heater, and the growth assembly is located inside the crucible. The silicon carbide seed gasket is detachably connected to the crucible gasket and the crucible body. Replacing silicon carbide seed gaskets of different sizes to obtain AlN seed crystals of corresponding sizes is easy to operate and fundamentally solves the problem of difficult diameter expansion during the growth of aluminum nitride crystals. Compared with the existing technology, AlN seed crystals The device and method for precise diameter expansion accelerates the growth and expansion rate of aluminum nitride crystals, saves the cost and time of aluminum nitride crystal growth and expansion, and accelerates the development process of the aluminum nitride crystal growth industry.

Description

technical field [0001] The invention relates to a device and method for accurately expanding the diameter of an AlN seed crystal, belonging to the field of crystal growth. Background technique [0002] In the process of growing aluminum nitride crystals using the PVT method, because the radial growth of AlN crystals is very difficult, the diameter of AlN crystals hardly changes, and the seed crystal is very important for crystal growth, and there is no corresponding high-quality and large-sized seed crystal , It is almost impossible to grow high-quality crystals, how to use the diameter expansion method in the crystal growth process of silicon carbide (continuous iterative growth, each time increasing the diameter a little) for AlN crystal growth, diameter expansion is more difficult and cycle and cost It will far exceed the diameter expansion of crystals such as silicon carbide, and each expansion cannot guarantee that the diameter will reach the expected state. [0003] B...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B35/00C30B29/40C30B23/00
CPCC30B35/007C30B29/403C30B23/00
Inventor 赵丽丽范国峰张胜涛袁文博刘德超
Owner 哈尔滨科友半导体产业装备与技术研究院有限公司
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