Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

MEMS device with optimized geometry for reducing the offset due to the radiometric effect

A technology of equipment and electronic equipment, applied in the field of MEMS inertial sensors, can solve the problems of offset deviation of the output signal of the accelerometer

Pending Publication Date: 2020-07-14
STMICROELECTRONICS SRL
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0038] Therefore, also with this known structure, the radiation effect produces a non-negligible torsional moment, which leads to an offset deviation in the output signal of the accelerometer

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • MEMS device with optimized geometry for reducing the offset due to the radiometric effect
  • MEMS device with optimized geometry for reducing the offset due to the radiometric effect
  • MEMS device with optimized geometry for reducing the offset due to the radiometric effect

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0053] Figure 8 and Figure 9 is a schematic diagram of a sensor 50 of the inertial type having a so-called "see-saw" configuration.

[0054] In detail, the sensor 50 includes a movable mass 51, which is suspended from a base plate 52 through a post 53 ( Figure 9 ), the column 53 extends from the base plate 52 parallel to the Z-axis of the Cartesian reference system XYZ. The column 53 is coupled to the movable mass 51 by hinges and springs (not shown), which enable the movable mass 51 to tilt about the axis A of rotation.

[0055] The movable mass 51 has a characteristic quantity (length in the X direction here) much larger, for example ten times larger, than its thickness. In particular, at rest, the movable mass 51 has major surfaces (top surface 51A and bottom surface 51B) extending in a plane parallel to the plane XY of the Cartesian reference system XYZ, and a thickness t extending parallel to the Z axis. p . Such as Figure 9 As can be seen in , the thickness t o...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The disclosure relates to a MEMS device with optimized geometry for reducing the offset due to the radiometric effect. The MEMS device with teeter-totter structure includes a mobile mass having an area in a plane and a thickness in a direction perpendicular to the plane. The mobile mass is tiltable about a rotation axis extending parallel to the plane and formed by a first and by a second half-masses arranged on opposite sides of the rotation axis. The first and the second masses have a first and a second centroid, respectively, arranged at a first and a second distance b1, b2, respectively, from the rotation axis. First through openings are formed in the first half-mass and, together with the first half-mass, have a first total perimeter p1 in the plane. Second through openings are formedin the second half-mass and, together with the second half-mass, have a second total perimeter p2 in the plane, where the first and the second perimeters p1, p2 satisfy the equation: p1*b1=p2*b2.

Description

technical field [0001] This disclosure relates to MEMS devices. In particular, the present disclosure relates to MEMS (Micro Electro Mechanical Systems) inertial sensors such as accelerometers or gyroscopes. Background technique [0002] As is known, the use of MEMS devices of the above-mentioned type is increasing in a wider technical field due to their ability to supply accurate signals, their low cost, and their high versatility. [0003] In particular, inertial sensors of the above-mentioned type are increasingly used in consumer applications as well as in the automotive field, for example for indoor navigation and as an aid to autonomous driving, i.e., inertial sensors of the above-mentioned type are increasingly used in applications in which important The goal is to have high precision and also provide as stable an output as possible when environmental and / or internal parameters vary. In particular, in these applications it is desirable that the output signal of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B81B5/00B81B7/00B81B7/02
CPCB81B7/02B81B5/00B81B7/0019B81B2201/0228G01P15/125G01P2015/0831G01C19/5712B81B2201/0235B81B2201/0242B81B2203/0118B81B2203/04B81B2203/058B81B2207/012G01P15/02G01P15/08
Inventor F·里奇尼A·托齐奥
Owner STMICROELECTRONICS SRL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products