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MOS gate transistor and construction method thereof

A technology for transistors and polysilicon layers, which is applied in semiconductor devices, semiconductor/solid-state device manufacturing, electrical components, etc., and can solve the problems of expensive process, complexity, and low breakdown voltage of lithography machines.

Active Publication Date: 2020-07-28
上海睿驱微电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] (1) Trench IGBT and IEGT have the disadvantage of low breakdown voltage BVces due to the higher electric field concentration around the bottom of the trench gate
[0005] (2) Traditional IGBT and IEGT structures require finer lithography, resulting in lower Vce(sat)
However, finer photolithography machines are very expensive and the process is very complicated

Method used

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  • MOS gate transistor and construction method thereof
  • MOS gate transistor and construction method thereof
  • MOS gate transistor and construction method thereof

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Embodiment Construction

[0031] Exemplary embodiments of the present invention will now be described with reference to the drawings; however, the present invention may be embodied in many different forms and are not limited to the embodiments described herein, which are provided for the purpose of exhaustively and completely disclosing the present invention. invention and fully convey the scope of the invention to those skilled in the art. The terms used in the exemplary embodiments shown in the drawings do not limit the present invention. In the figures, the same units / elements are given the same reference numerals.

[0032] Unless otherwise specified, the terms (including scientific and technical terms) used herein have the commonly understood meanings to those skilled in the art. In addition, it can be understood that terms defined by commonly used dictionaries should be understood to have consistent meanings in the context of their related fields, and should not be understood as idealized or over...

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Abstract

The invention discloses an MOS gate transistor and a construction method thereof. The MOS gate transistor comprises an emitter, a polycrystalline silicon gate structure, an n type polycrystalline silicon layer, a p base region, an n+ type emitter region, an n- type drift region, an n- type buffer region, a p type collector region and a collector, wherein the n type polycrystalline silicon layer isarranged above the n- type drift region, and the p base region and the n+ type emitter region are formed in the n type polycrystalline silicon layer; the polycrystalline silicon gate structure is arranged on the n type polycrystalline silicon layer and comprises a gate oxide layer, a polycrystalline silicon gate film and silicide containing boron and phosphorus which are arranged from bottom to top, and an emitter is arranged above the silicide containing boron and phosphorus; contact holes are formed above the p base region and the n+ type emitter region; the n+ type buffer region is arranged below the n- type drift region, and the p type collector region and the collector are sequentially arranged below the n+ type buffer region. According to the MOS gate transistor, the values of the on-state voltage and the off-state time can be taken into consideration, and relatively ideal carrier distribution is realized.

Description

technical field [0001] The invention relates to the field of semiconductors, in particular to a MOS gate transistor and a construction method thereof. Background technique [0002] IGBTs are the most widely used power devices in power electronics applications such as home appliances, industrial, renewable energy, UPS, railway, motor drive and EV&HEV applications. Transistors with very high current handling capabilities due to the presence of bipolar junctions, on the order of hundreds of amps, with a blocking voltage of 6500V. These IGBTs can control loads of hundreds of kilowatts and have a wide range of applications. IGBTs are especially suitable for applications with low frequency, high voltage and load variation, such as locomotive trains, electric vehicles and hybrid electric vehicles. Growth in the renewable energy sector such as solar and wind power has increased the demand for high-power IGBTs. The electric motors used in wind turbines are of the variable speed ty...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L29/739H01L21/331H01L29/06
CPCH01L29/7393H01L29/66325H01L29/0642
Inventor 樱井建弥吴磊曹明霞
Owner 上海睿驱微电子科技有限公司