Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nail polish removing cream

A technology of nail polish remover and acetone nail polish remover, applied in the field of nail polish remover, can solve problems such as pungent nose, dull and dry nail surface, and achieve the effect of safe use

Pending Publication Date: 2020-08-14
上海妮诺化妆品有限公司
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Fourth, in order to achieve a high elution effect, the traditional nail polish remover often has a high volatility that not only brings a pungent feeling, but also makes the surface of the nail surface dull and dry.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nail polish removing cream
  • Nail polish removing cream
  • Nail polish removing cream

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Product ingredients:

[0036] Propylene Carbonate 67.5%, White Beeswax 10%, Brazilian Wax Palmitate Wax 8%, Dimethicone 3.5%, Macadamia Nut Seed Oil 3%, Almond Oil 2%, Sesame Seed Oil 2%, Caprylyl Glycol 1.5%, ascorbyl palmitate 1%, citric acid 1%, cetearyl alcohol 0.5%.

[0037] Preparation:

[0038] Step 1: Mix 10 parts of white beeswax, 8 parts of Brazilian wax palmitic acid wax, 3.5 parts of dimethicone, 3 parts of macadamia nut oil, 2 parts of almond oil, 2 parts of sesame seed oil, 1.5 parts of caprylyl glycol , mix slowly and heat to 85°C, stir at 100-200 revolutions per minute for 2 hours.

[0039] Step 2: Stir at a speed of 100-200 revolutions per minute, and naturally cool down to 45°C, and keep warm for 3 hours.

[0040] Step 3: Add 67.5 parts of propylene carbonate, 1 part of ascorbyl palmitate, 1 part of citric acid, and 0.5 part of cetearyl alcohol after 3 hours of heat preservation, and stir for 45 minutes at 100-200 rpm.

[0041] Step four:

[0042]...

Embodiment 2

[0049] Product ingredients: acetone-free nail polish remover (can be propylene carbonate or other non-acetone solvents that can be used to remove nails) 76%, wax 10%, vegetable oil 8%, nut oil 2%, almond oil 2%, palmitic acid 1% ester, 1% citric acid, etc.

[0050] Preparation:

[0051] Step 1: Mix 10 parts of wax, 8 parts of vegetable oil, 2 parts of nut oil, and 2 parts of almond oil, slowly heat to 85°C, and stir at 100-200 rpm for 2 hours;

[0052] Step 2: Stir at a speed of 100-200 rpm, and naturally cool down to 45°C, and keep warm for 3 hours;

[0053] Step 3: After 3 hours of heat preservation, add 76 parts of acetone-free nail polish remover, 1 part of palmitate, and 1 part of citric acid, and stir at 100-200 rpm for 45 minutes;

[0054] Step 4: Cool down to room temperature naturally, and the item becomes a fixed paste, ready to use.

[0055] Instructions:

[0056] Apply an appropriate amount of nail polish remover evenly on the nails, and wipe back and forth sev...

Embodiment 3

[0058] Product ingredients: acetone-free nail polish remover (can be propylene carbonate or other non-acetone solvents that can be used to remove nails) 70%, wax 12%, sesame oil 14%, nut oil 1%, almond oil 1%, vitamin E0 .5%, ascorbyl palmitate 1%, citric acid 0.5%, etc.

[0059] Preparation:

[0060] Step 1: Mix wax, sesame oil, nut oil, almond oil, and vitamin E and heat slowly to 75°C, stirring at 100-200 rpm for 2.5 hours;

[0061] Step 2: Stir at a speed of 100-200 rpm, and naturally cool down to 45°C, and keep warm for 3 hours;

[0062] Step 3: After 3 hours of heat preservation, add acetone-free nail polish remover, ascorbyl palmitate, and citric acid, and stir at 100-200 rpm for 45 minutes;

[0063] Step 4: Cool down to room temperature naturally, and the item becomes a fixed paste, ready to use.

[0064] Instructions:

[0065] Apply an appropriate amount of nail polish remover evenly on the nails, and wipe back and forth several times with a cotton pad to remove t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides nail polish removing cream characterized by being prepared from the substances containing the following components: 65-80% of an acetone-free nail polish remover, 5-25% of wax,0.5-15% of vegetable oil, 0.1-5% of a nail care component, 0.1-1% of palmitate and 0.1-1% of citric acid. The product is a cream-like nail polish removing product which has good removing effects and contains no acetone.

Description

technical field [0001] The present invention relates to a cosmetic product, in particular to a nail polish remover. Background technique [0002] Traditional nail polish removers are generally liquid nail polish removers. During use, you need to soak the cotton pad and then wipe the nail surface to remove it. During this process, excess liquid may drip. [0003] Secondly, because it is a liquid, the solvent content is high, and such solvents often have strong volatility, so when used, the smell is strong, and there are problems of poor consumer experience and consumer concerns. [0004] Its three, in order to realize good elution effect, existing nail polish remover often contains a large amount of acetone components that are irritating, unsafe to use, and harmful to human body. [0005] Fourth, in order to achieve high elution effect, traditional nail polish remover not only brings a pungent feeling to its high volatility, but also makes the nail surface dull and dry. Co...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A61K8/06A61K8/02A61K8/37A61K8/31A61K8/92A61K8/67A61K8/365A61K8/34A61K8/891A61K8/73A61Q3/04
CPCA61K8/06A61K8/02A61K8/375A61K8/31A61K8/922A61K8/676A61K8/365A61K8/927A61K8/345A61K8/342A61K8/891A61K8/678A61K8/735A61Q3/04
Inventor 卢咏斌
Owner 上海妮诺化妆品有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products