Ultrasonic welding method
A technology of ultrasonic welding and welding method, which is applied in the manufacture of electrical components, electric solid-state devices, semiconductor/solid-state devices, etc., can solve the problems such as the inability to effectively improve the welding reliability and welding efficiency, and the poor improvement effect.
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Embodiment 1
[0060] S1: Clean the surface of the chip and the substrate to remove impurities other than metal and metal oxide on the surface of the solder ball and the pad; apply a 2mm thick photoresist on the substrate, and remove the photoresist on the surface of the pad remove.
[0061] S2: Place the substrate in the reaction chamber, then vacuumize the reaction chamber and then fill it with high-purity oxygen, repeat three times, and then pass high-purity oxygen into the reaction chamber to fill the chamber with high-purity oxygen, the air pressure is 1 atmospheric pressure; heat the chamber to 275°C, continuously feed high-purity oxygen (gas flow rate of 40sccm) during the period, and continuously discharge the reacted gas, continue to react for 6 hours, and oxidize a layer of metal oxide on the surface of the pad; figure 2 shown.
[0062] S3: Lowering the temperature of the reaction chamber, exhausting the oxygen in the chamber, taking out the parts to be welded, and removing the p...
Embodiment 2
[0069] S1: Clean the surface of the chip and the substrate to remove impurities other than metal and metal oxide on the surface of the solder ball and the pad; apply a 3mm thick photoresist on the substrate, and remove the photoresist on the surface of the pad remove.
[0070] S2: Place the substrate in the reaction chamber, then vacuumize the reaction chamber and then fill it with high-purity oxygen, repeat three times, and then pass high-purity oxygen into the reaction chamber to fill the chamber with high-purity oxygen, the pressure is 1 atmospheric pressure; heat the chamber to 270°C, continuously feed high-purity oxygen (gas flow rate of 45 sccm) during this period, and continuously discharge the reacted gas, continue to react for 6 hours, and oxidize a layer of metal oxide on the surface of the pad.
[0071] S3: Lowering the temperature of the reaction chamber, exhausting the oxygen in the chamber, taking out the parts to be welded, and removing the photoresist on the su...
Embodiment 3
[0078] S1: Clean the surface of the chip and the substrate to remove impurities other than metal and metal oxide on the surface of the solder ball and the pad; apply a 3mm thick photoresist on the substrate, and remove the photoresist on the surface of the pad remove.
[0079] S2: Place the substrate in the reaction chamber, then vacuumize the reaction chamber and then fill it with high-purity oxygen, repeat three times, and then pass high-purity oxygen into the reaction chamber to fill the chamber with high-purity oxygen, the pressure is 1 atmospheric pressure; heat the chamber to 280°C, continuously feed high-purity oxygen (gas flow rate of 43 sccm) during this period, and continuously discharge the reacted gas, continue to react for 8 hours, and oxidize a layer of metal oxide on the surface of the pad.
[0080] S3: Lowering the temperature of the reaction chamber, exhausting the oxygen in the chamber, taking out the parts to be welded, and removing the photoresist on the su...
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