Dual-wavelength femtosecond laser color marking device

Abstract

The invention relates to the technical field of laser processing, in particular to a dual-wavelength femtosecond laser color marking device. The dual-wavelength femtosecond laser color marking devicecomprises a dual-wavelength femtosecond laser device, a fundamental frequency light reflector, a dichroic mirror, a dual-wavelength beam expander, a dual-wavelength scanning galvanometer and a dual-wavelength focusing field lens. According to the dual-wavelength femtosecond laser color marking device provided by the embodiment of the invention, the dual-wavelength femtosecond laser device can be switched between fundamental frequency light and frequency doubling light for output, a color marking function of different color systems can be realized by different wavelengths, the color gamut of femtosecond laser for color marking can be greatly expanded by the function, wider application of the technology is facilitated, the fine and gorgeous color marking function which cannot be achieved bya nanosecond laser marking machine can be achieved, marking of different color systems can be achieved on the same material through dual-wavelength switching, and the dual-wavelength femtosecond lasercolor marking device has wide application prospects in the industries of jewelry colorful marking, high-end consumer goods anti-counterfeiting, color LOGO, medical alloy marking and the like.

Description

Technical field [0001] The invention relates to the technical field of laser processing, in particular to a dual-wavelength femtosecond laser color marking device. Background technique [0002] As a non-contact processing method, laser marking technology can be used to mark any special-shaped surface without deformation and internal stress on the workpiece itself. It has been widely used in marking materials such as metal, plastic, glass, ceramic, wood, leather, etc. . The basic principle is to focus the high-energy laser beam to the surface of the workpiece, so that the surface material is melted or even vaporized instantly, and the processing path of the laser on the surface of the material is controlled to form the graphic mark required by the user. [0003] At present, most common laser marking machines use nanoseconds (ns, 10 -9 s) Pulsed light sources, including carbon dioxide lasers, fiber lasers and nanosecond ultraviolet lasers, mainly rely on thermal effects for material...

AI Technical Summary

Problems solved by technology

[0004] The present invention aims at the above-mentioned deficiencies existing in the existing laser marking machines using nanosecond pulse light sources, and provides a dual-wavelength femtosecond laser color marking device, which solves the problem of the current laser marking machine. Mostly in nanoseconds (ns, 10 -9 s) The pulse light source mainly relies on the thermal effect for material removal, which can only be used for black and white marking, and cannot achieve fine and brilliant color marking.

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