Display panel preparation method and display device

A technology for display panels and substrates, which is applied in semiconductor/solid-state device manufacturing, instruments, semiconductor devices, etc., and can solve problems such as substrate barrier layer corrosion and hollowing out

Active Publication Date: 2020-10-27
SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a display panel preparation method and a display device to solve the phenomenon that the photoresist strippin...

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Display panel preparation method and display device
  • Display panel preparation method and display device
  • Display panel preparation method and display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0030] The following describes the preferred embodiments of the present invention with reference to the accompanying drawings to prove that the present invention can be implemented. The embodiments of the invention can fully introduce the present invention to those skilled in the art, making its technical content clearer and easier to understand. The present invention can be embodied by many different forms of invention embodiments, and the protection scope of the present invention is not limited to the embodiments mentioned herein.

[0031] In the drawings, components with the same structure are denoted by the same numerals, and components with similar structures or functions are denoted by similar numerals. The size and thickness of each component shown in the drawings are arbitrarily shown, and the present invention does not limit the size and thickness of each component. In order to make the illustration clearer, the thickness of parts is appropriately exaggerated in some ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Login to view more

Abstract

The invention provides a display panel preparation method and a display device. The Display panel preparation method comprises the following steps: providing a substrate; and forming a barrier layer on the substrate; an electrode layer being on the barrier layer; forming a photoresist layer on the electrode layer; forming a protective layer on the substrate, wherein the protective layer covers thebarrier layer and the exposed surface of the electrode layer; stripping the photoresist layer by using a stripping solution; and removing the protective layer.

Description

technical field [0001] The invention relates to the field of display equipment, in particular to a method for preparing a display panel and a display device. Background technique [0002] In the existing display panel technology, because copper and other metals use photoresist (Photoresistance, PR) in the process of metal patterning, metal corrosion will occur in the subsequent photoresist stripping process, and metal corrosion will lead to metal hollowing out. Phenomenon. For example, copper hollowing will form metal tips, and different layers of metals are prone to electrostatic (ElectroStatic Discharge, ESD) breakdown in the subsequent manufacturing process, which has a great impact on product yield. After patterning copper and other metals, it is necessary to use a photoresist stripping solution to remove the remaining photoresist, and the photoresist stripping solution contains organic substances with amine groups, and the organic substances with amine groups dissociat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): H01L21/3213H01L51/52G02F1/1343
CPCH01L21/32139G02F1/1343H10K50/805
Inventor 胡小波
Owner SHENZHEN CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products