A positive low temperature curable photosensitive resin composition

A photosensitive resin, curing-type technology, applied in optics, optomechanical equipment, photosensitive materials for optomechanical equipment, etc., can solve the problems of unusable, unable to form organic insulating film, flexible substrate damage, etc., to achieve low Effect of temperature process, excellent moisture resistance and flexibility, excellent chemical resistance
CN112198760BActive Publication Date: 2021-07-02上海玟昕科技有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
上海玟昕科技有限公司
Publication Date
2021-07-02

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Abstract

A positive low-temperature curable photosensitive resin composition, comprising an acrylic copolymer resin represented by Chemical Formula 1, a photosensitive agent composed of 1,2-diazidonaphthoquinone sulfonate compound, and a leveling agent , an additive and a solvent of at least one of curing agent and silane coupling agent. [chemical formula 1]
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Description

technical field

[0001] The invention relates to a low-temperature curable photosensitive resin composition. More specifically, it relates to a low-temperature-curable photosensitive resin composition capable of forming an insulating film pattern or a protective film pattern having excellent reliability (adhesion) and chemical resistance even under low-temperature process conditions according to the present invention. Background technique

[0002] In the display field, the low-temperature-curable photosensitive resin composition is used to form a photocurable pattern of an insulating film, a protective film, and the like. Since the photosensitive resin composition contains a photosensitizer, the photosensitizer of the photosensitive resin composition decomposes and undergoes an acidification reaction when light is irradiated.

[0003] The photosensitive resin composition is first coated on a substrate to form a photosensitive resin film. Afterwards, a photolithography proce...

Claims

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