A negative low temperature curable photosensitive resin composition
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 上海玟昕科技有限公司
- Publication Date
- 2021-07-09
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Abstract
Description
technical field
[0001] The invention relates to a negative low temperature curable photosensitive resin composition. More specifically, according to the present invention, it relates to a low-temperature curable photosensitive resin composition that has excellent curing reactivity even under low temperature conditions, can form a pattern with excellent reliability (adhesion), and is excellent in chemical resistance. Background technique
[0002] In the display field, the low-temperature-curable photosensitive resin composition is used to form a photocurable pattern of an insulating film, a protective film, and the like. Specifically, the low-temperature curable photosensitive resin composition is selectively exposed and developed through the photolithography process to obtain the desired photocured pattern. In order to improve the process yield in this process, a photosensitive resin with high sensitivity is required. combination.
[0003] The low-temperature curable photo...