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Quantum dot, curable composition, cured layer, color filter, and display device

A technology of quantum dots and compositions, applied in chemical instruments and methods, instruments, optical filters, etc., can solve problems such as difficult to improve light efficiency and absorption rate, failure to solve deposition problems and low light efficiency

Pending Publication Date: 2021-02-02
SAMSUNG SDI CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it is difficult to increase light efficiency and absorbance due to viscosity limitation
At the same time, attempts have been made to reduce the content of quantum dots and increase the content of light diffusers (scatterers) in other improvement directions, but this also failed to solve the problem of deposition and low light efficiency

Method used

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  • Quantum dot, curable composition, cured layer, color filter, and display device
  • Quantum dot, curable composition, cured layer, color filter, and display device
  • Quantum dot, curable composition, cured layer, color filter, and display device

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0275] 92 grams of thioglycolic acid (thioglycolic acid) (Sigma Aldrich Co., Ltd. (SigmaAldrich Co., Ltd.)), 400 grams of polyoxyethylene monomethyl ether (polyoxyethylene monomethyl ether) (Hannong Chemicals Inc.)), 20 grams of p-toluenesulfonic acid monohydrate (Sigma Aldrich Ltd.) and 500 milliliters of cyclohexane were put together, and then when the mixture was heated under nitrogen atmosphere so that the cyclohexane could be refluxed, The water generated therein was removed by using a dean stark apparatus. When no more water was produced, the reactant was cooled to room temperature and then washed by using ethyl acetate and distilled water. The organic layer was neutralized by using NaOH diluent. Subsequently, the neutralized resultant was washed several times by using distilled water, by using MgSO 4 Treated to dry moisture, and then concentrated under reduced pressure to finally obtain the compound represented by Chemical Formula 1-1.

[0276] [chemical formula 1-1]...

preparation example 2

[0285] 92 g of thioglycolic acid (Sigma-Aldrich Ltd.), 206 g of tripropylene glycol monomethyl ether (mixture of isomers, Tokyo Chemical Industry Co., Ltd. (TCI)), 10 g of p-toluenesulfonic acid monohydrate ( Sigma Aldrich Co., Ltd.) and 500 ml of cyclohexane were put together, and then the water produced therein was removed by using a Dean Stark apparatus while heating the mixture under a nitrogen atmosphere so that the cyclohexane could be refluxed. When no more water was produced, the reaction was cooled to room temperature and then washed by using ethyl acetate and excess distilled water. The organic layer was neutralized by using NaOH diluent. Subsequently, the neutralized resultant was washed several times by using distilled water, by using MgSO 4 Treated to dry moisture, and then concentrated under reduced pressure to finally obtain the compound (ligand) represented by Chemical Formula 1-2.

[0286] [chemical formula 1-2]

[0287]

[0288] (preparation of surface ...

preparation example 3

[0291] 106 grams of 3-mercaptopropionic acid (3-mercaptopropionic acid) (Sigma-Aldrich Co., Ltd.), 400 grams of polyoxyethylene monomethyl ether (Han Nong Chemical Co., Ltd.), 20 grams of p-toluenesulfonic acid monohydrate (Sigma Aldrich Co., Ltd.) and 500 ml of cyclohexane were put together, and then the water produced therein was removed by using a Dean Stark apparatus while heating the mixture under nitrogen atmosphere so that the cyclohexane could be refluxed. When no more water was produced, the reactant was cooled to room temperature, and then washed by using ethyl acetate and distilled water. The organic layer was neutralized by using NaOH diluent. Subsequently, the neutralized resultant was washed several times by using distilled water, by using MgSO 4 Treated to dry moisture, and then concentrated under reduced pressure to finally obtain the compound (ligand) represented by Chemical Formula 1-3.

[0292] [chemical formula 1-3]

[0293]

[0294] (preparation of s...

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Abstract

The invention discloses a quantum dot surface-modified with a specific compound, a non-solvent curable composition, a solvent curable composition, a cured layer, a color filter, and a display device.The quantum dot surface-modified with a specific ligand of the present invention can be easily applied to all photocurable compositions, solvent-based thermosetting compositions, and non-solvent-basedthermosetting compositions, and thus can have improved viscosity and optical characteristics and processability.

Description

[0001] Cross References to Related Applications [0002] This application claims priority and benefit from Korean Patent Application No. 10-2019-0091233 filed with the Korean Intellectual Property Office on July 26, 2019, the entire contents of which are incorporated herein by reference. technical field [0003] The present disclosure relates to a quantum dot, a curable composition including the quantum dot, a cured layer using the composition, a color filter including the cured layer, and a display device including the color filter. Background technique [0004] In the case of general quantum dots (quantum dots), due to their hydrophobic surface features, their dispersion solvents are limited. Therefore, it is difficult to incorporate into polar systems such as adhesives or curable monomers. [0005] For example, even in the case of actively researched quantum dot ink compositions, in an initial step, the polarity is relatively low and it can be dispersed in the solvent us...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09K11/02C09K11/08B82Y20/00B82Y30/00G02B5/20G03F7/004G03F7/027G03F7/09
CPCC09K11/025C09K11/08G03F7/004G03F7/027G03F7/09G02B5/20B82Y20/00B82Y30/00C08F222/102G02B2207/101G02B2207/113G02B5/26G02B5/206G02B5/201B82Y40/00C08K9/04C08K5/09C08K5/17C08K5/54G03F7/0007G02F1/133514C08F220/18
Inventor 姜龙熙金钟基金东俊金美善朴民志李范珍林知泫崔美贞
Owner SAMSUNG SDI CO LTD