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Method for testing UV ratio of positive photoresist

A positive photoresist and ratio technology, which is used in the preparation of test samples and the measurement of color/spectral characteristics, which can solve the problems of cumbersome process and waste of diluent.

Pending Publication Date: 2021-02-19
陕西彩虹新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Usually, the method of testing the UV ratio of positive photoresist uses a volumetric flask to dilute step by step, and then measure, the process is cumbersome and causes a lot of waste of diluent

Method used

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  • Method for testing UV ratio of positive photoresist

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Embodiment one (3.2cP positive photoresist):

[0026] First, use propylene glycol methyl ether acetate solution as a blank substrate, read the absorbance values ​​at 280nm and 350nm, and the values ​​are all between ±0.0005, and then the sample can be tested. Take a 34uL sample with a micro syringe, inject it into a 50mL volumetric flask cleaned with propylene glycol methyl ether acetate, set the volume to the mark, oscillate fully, and dissolve. Clean the cuvette with the sample for 5 times, pour the sample to the scale line of the cuvette, wipe the surface of the cuvette clean with a dust-free paper, put the cuvette into the sample holder, start the test of the sample, read 280nm and 350nm The Abs values ​​at are 1.813 and 0.483 respectively, and the calculated UV ratio is 3.754;

Embodiment 2

[0027] Embodiment two (3.5cP positive photoresist):

[0028] Take 34uL of positive photoresist sample with a micro-syringe, other steps are the same as in Example 1, the obtained diluted solution is measured, and the Abs values ​​at 280nm and 350nm are read, which are 1.815 and 0.483 respectively, and the calculated UV ratio is 3.757;

Embodiment 3

[0029] Embodiment three (3.6cP positive photoresist):

[0030] Take 34uL of positive photoresist sample with a micro-syringe, other steps are the same as in Example 1, the obtained diluted solution is measured, and the Abs values ​​at 280nm and 350nm are read, which are 1.819 and 0.484 respectively, and the calculated UV ratio is 3.758;

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Abstract

The invention discloses a method for testing the UV ratio of a positive photoresist, and the method is characterized in that method comprises the following steps: adding the positive photoresist intoa solvent to prepare a sample to be tested, obtaining a diluted positive photoresist UV curve according to a blank substrate, and calculating the UV ratio to obtain the content ratio of resin to a photosensitizer in the positive photoresist. The method comprises the following steps: S1) correcting an instrument by taking a solvent as a blank substrate; S2) slowly extracting a positive photoresistsample by using a microinjector; S3) injecting the sample into a volumetric flask cleaned with a solvent, fixing the volume, and oscillating uniformly; S4) cleaning the cuvette with a sample, pouringthe sample to cuvette scale marks, and wiping the surface of the cuvette; S5) putting the cuvette into a sample rack, and starting to determine the UV absorbance; S6) reading data and calculating theUV ratio. The whole process is short in time consumption, less in reagent waste, accurate in dilution and good in repeatability. The positive photoresist sample can be manually and efficiently diluted.

Description

technical field [0001] The invention relates to a test method, in particular to a test method for the UV ratio of a positive photoresist. Background technique [0002] Photoresist is a kind of polymer material with photosensitive chemical action (or sensitive to electron energy), also known as photoresist, which is composed of three main components: resin, photosensitive compound (PAC) and solvent. Sensitive mixed liquid, in addition, according to different requirements, also add a certain amount of additives. After the resin is illuminated, photochemical reactions can quickly occur in the exposed area, making the physical properties of this material, especially solubility, affinity, etc., change significantly, so it has been widely used in the fields of flat panel display, integrated circuits, and semiconductor packaging. a wide range of applications. Photoresist can be divided into positive photoresist and negative photoresist according to how it responds to ultraviolet ...

Claims

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Application Information

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IPC IPC(8): G01N21/33G01N1/38
CPCG01N21/33G01N1/38
Inventor 马阳阳张月张东宏
Owner 陕西彩虹新材料有限公司
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