Micro-LED array of transparent electrode structure and production method
A technology of transparent electrodes and arrays, applied in the field of optoelectronics, which can solve the problems of the influence of Micro-LED light output and the large area of P-type metal electrodes.
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[0027] In order to make the technical problems and technical solutions to be solved by the present invention clearer, the detailed description will be described below in conjunction with the accompanying drawings.
[0028] refer to figure 1 , figure 2 A Micro-LED array with a transparent electrode structure, comprising:
[0029] Substrate 2;
[0030] N-type GaN 3 prepared on the substrate 2;
[0031] The quantum well active region 4 is prepared on the N-type GaN 3;
[0032] P-type GaN 5 prepared on the quantum well active region 4;
[0033] The step 12 is formed by etching the epitaxial material to N-type GaN;
[0034] Transparent electrode ITO 6, prepared on P-type GaN and step sidewalls and N-type GaN;
[0035] The N-type metal electrode 9 is prepared on the N-type GaN;
[0036] The P-type metal electrode is prepared on the transparent electrode on the N-type GaN;
[0037] Pixel unit deep isolation trench 10, etch the epitaxial material to the substrate to electrica...
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Abstract
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