Preparation method of quantum dot color conversion array

Abstract

The invention provides a method for preparing a quantum dot color conversion array, which includes the following steps: S1. First, inject a carrier into the microchannel, and then inject a quantum dot solution into the microchannel one by one, and make the quantum dots flow through the flow of the carrier in the microchannel. The dot solution fills the micro-channel at a preset interval; S2, solidifying the quantum dot solution to form a quantum dot color conversion array. The preparation method has the advantages of simple process, convenient operation and low cost, and can realize the preparation of the quantum dot color conversion array of small-sized pixels.

Description

technical field [0001] The invention relates to the technical field of micro-nano preparation, in particular to a method for preparing a quantum dot color conversion array based on micro-channel technology. Background technique [0002] At present, there are two main methods for preparing high-density, micro-pixel-sized quantum dot color conversion arrays, namely inkjet printing and photoresist doping patterning. Inkjet printing technology is limited by the accuracy of the equipment. Inkjet printing is difficult to control uniformity and prone to "coffee ring effect", and it is difficult to realize when the pattern is less than 20μm. Although photoresist doping and patterning can realize the preparation of quantum dot color conversion arrays with a small size below 10 μm, the doped photoresist tends to degrade quantum dots, reduce their conversion efficiency, and cause a large amount of quantum dots to be wasted. Contents of the invention [0003] The purpose of the prese...

AI Technical Summary

Problems solved by technology

Inkjet printing technology is limited by the accuracy of the equipment. Inkjet printing has the characteristics of difficult control of uniformity and prone to "coffee ring effect", and it is difficult to realize when the pattern is less than 20μm

Although photoresist doping and patterning can realize the preparation of quantum dot color conversion arrays with a small size below 10 μm, the doped photoresist tends to degrade quantum dots, reduce their conversion efficiency, and cause a large amount of quantum dots to be wasted.

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