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Transfer method and transfer system of micro device

A transfer method and transfer system technology, applied in the field of micro device transfer, can solve problems such as damaged chips and difficult transfer methods

Inactive Publication Date: 2021-06-18
CHONGQING KONKA PHOTOELECTRIC TECH RES INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the above-mentioned technologies are in direct contact with the chip, and all have the disadvantage of damaging the chip.
[0003] On the other hand, as the size of Micro-LED chips gradually shrinks, all the above transfer methods will become more and more difficult
According to industry development forecasts, applications such as virtual reality and enhanced display require micro-device sizes less than or equal to 5 microns to achieve better visual effects, which poses a huge challenge to existing technology routes

Method used

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  • Transfer method and transfer system of micro device
  • Transfer method and transfer system of micro device
  • Transfer method and transfer system of micro device

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Embodiment Construction

[0045] In order to facilitate the understanding of the present application, the present application will be described more fully below with reference to the relevant drawings. Preferred embodiments of the application are shown in the accompanying drawings. However, the present application can be embodied in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the application more thorough and comprehensive.

[0046] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the technical field to which this application belongs. The terminology used herein in the description of the application is only for the purpose of describing specific embodiments, and is not intended to limit the application.

[0047] The existing transfer methods of various micro devices are all in direct c...

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Abstract

The invention relates to a transfer method and a transfer system of micro devices. The method comprises the following steps of: dividing first laser into second laser and third laser; providing the second laser to a laser lift-off assembly, so that the laser lift-off assembly lifts off a micro device from a substrate; and providing the third laser to an optical tweezers adjusting assembly, and picking up and transferring the stripped micro device to a back plate through the optical tweezers adjusting assembly. Through the method, the micro device is only in contact with the laser, the micro device can be prevented from being damaged, and the method can be suitable for transfer of small-size micro devices. Therefore, the micro device can be stripped from the substrate and the stripped micro device can be picked up and transferred only by using the first laser for light splitting, so that the number of laser assemblies can be reduced, and the cost is saved.

Description

technical field [0001] The invention relates to the technical field of micro-device transfer, in particular to a micro-device transfer method and transfer system. Background technique [0002] At present, the biggest technological bottleneck in the micro-LED (Micro-LED) chip manufacturing process is the chip transfer link. The existing chip transfer methods mainly use technologies such as electrostatic force, van der Waals force, magnetic force, fluid self-assembly, and roller transfer printing. However, the above-mentioned technologies are all in direct contact with the chip, and all have the disadvantage of damaging the chip. [0003] On the other hand, as the size of Micro-LED chips gradually shrinks, all the above transfer methods will become more and more difficult. According to industry development forecasts, applications such as virtual reality and enhanced display require micro-device sizes less than or equal to 5 microns to achieve better visual effects, which pose...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/48H01L21/683B23K26/122B23K26/57B23K26/70G21K1/00
CPCH01L33/48H01L21/6835B23K26/122B23K26/57B23K26/704G21K1/006H01L2221/68386H01L2933/0033
Inventor 范春林张杨汪庆王斌
Owner CHONGQING KONKA PHOTOELECTRIC TECH RES INST CO LTD
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