Method for preparing diamond by multi-energy coupling plasma chemical vapor deposition method

A technology of chemical vapor deposition and coupled plasma, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of uncoupling energy, parameter fluctuations, and more stringent requirements for process parameters, etc., and achieve control The effect of high tolerance, reduced control requirements, and easy method

Active Publication Date: 2021-06-25
SHANGHAI BOSHIGUANG SEMICON TECH CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

With the progress of industrialization, people found some problems in use, such as the hot wire method is cheap, but the quality of diamond is not high, the microwave method is of high quality, but the equipment is complicated, and it is difficult to reduce the cost by enlarging the production; the arc torch method can produce High-quality single crystal optical grade diamond, but the internal stress of diamond is relatively large, the cost is high, and the yield is less than 80%
[0003] In order to take advantage of the low cost of the hot wire, the inventor proposed in CN112030133A to utilize magnetic resonance, hot wire, DC coupling or utilize magnetic resonance, hot wire, high frequency coupling to prepare high-quality diamond, although it can improve the deposition of diamond However, due to the use of magnetic resonance, the req...

Method used

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  • Method for preparing diamond by multi-energy coupling plasma chemical vapor deposition method
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  • Method for preparing diamond by multi-energy coupling plasma chemical vapor deposition method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1 to 6

[0088] The preparation procedures of Examples 1 to 6 are as follows, and the parameters in the preparation process are shown in Table 1.

[0089] (1) Background vacuum preparation;

[0090] (2) Deposition gas ratio control;

[0091] (3) Control of the vacuum degree of the deposition chamber;

[0092] (4) Setting of heating wire power supply and ionization current setting value;

[0093] (5) The power of the pulse bias power supply is set to 5kW, and the duty cycle, frequency, bias voltage and pulse bias current setting value of the pulse bias power supply are set;

[0094] (6) Set the power of the rotating magnetic field to 10, and set the magnetic field strength and rotational angular velocity of the rotating magnetic field;

[0095] (7) During the deposition process, when the deviation between the ionization current detected by the Langmuir probe and the set value of the ionization current is ≥ 2%, the power of the heating wire power supply should be adjusted up or down a...

Embodiment 1

[0102] The flatness of the diamond prepared by the method of Example 1 is about 0.1%, and the area of ​​the diamond is 200mm×200mm.

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Abstract

The invention discloses a method for preparing diamond through a multi-energy coupling plasma chemical vapor deposition method. According to the plasma chemical vapor deposition method, a hot wire, a pulsed bias power supply and a rotating magnetic field are coupled to serve as a composite energy source, and the hot wire is used for exciting carbon-containing gas to generate primary plasma; pulsed bias voltage is used for applying an electric field to the primary plasma generated by the hot wire, so that the primary plasma is stretched under the coupling action of the electric field and forms secondary plasma with a wider coverage area, the rotating magnetic field acts on a surface area of a diamond deposition substrate, particle energy in the secondary plasma is further homogenized and coupled, and the proportion of particles capable of forming a carbon structure of SP3 in the plasma is increased. According to the method, the high-quality diamond can be stably obtained, the control requirements for deposition conditions and technological parameters are relatively low, and the method is easy to control, high in regulation and control tolerance, wide in application range and particularly suitable for industrial production of the diamond.

Description

technical field [0001] The invention belongs to the field of preparation of superhard materials, and in particular relates to a method for preparing diamond by a multi-energy coupling plasma chemical vapor deposition method. Background technique [0002] Diamond has many preparation methods, such as hot wire plasma, microwave plasma, arc plasma chemical vapor deposition, etc. With the progress of industrialization, people found some problems in use, such as the hot wire method is cheap, but the quality of diamond is not high, the microwave method is of high quality, but the equipment is complicated, and it is difficult to reduce the cost by enlarging the production; the arc torch method can produce High-quality single crystal optical grade diamond, but the internal stress of diamond is relatively large, the cost is high, and the yield is less than 80%. [0003] In order to take advantage of the low cost of the hot wire, the inventor proposed in CN112030133A to utilize magne...

Claims

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Application Information

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IPC IPC(8): C23C16/27C23C16/517C23C16/52
CPCC23C16/271C23C16/517C23C16/52
Inventor 王涛魏远征张雪梅王箫徐念胡常青赵建海
Owner SHANGHAI BOSHIGUANG SEMICON TECH CO LTD
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