Single crystal furnace liquid opening distance double-point measurement method and device with guide cylinder as reference

Abstract

The invention discloses a single crystal furnace liquid opening distance double-point measurement method and device with a guide cylinder as a reference. The method comprises the steps that 1, a CCD camera is used for shooting the bottom end of the guide cylinder, and an image schematic diagram of parallel projection of the guide cylinder on the liquid level is obtained; 2, three measuring lines are set on an inverted image circular ring of the image schematic diagram at equal pixel intervals; 3, the liquid outlet distance is directly calculated according to the three obtained measuring lines and a determined value obtained when the guide cylinder is installed. The liquid outlet distance is calculated by only using three measuring lines and a determined value obtained when the CCD camera is installed, so that introduction of a proportionality coefficient and selection of a corresponding point of a boundary point in an inverted image are avoided, and the efficiency and the accuracy of the liquid outlet distance are improved.

Description

technical field [0001] The present invention relates to the technical field of monocrystalline silicon production, and more specifically, the present invention relates to a method and device for measuring the distance between liquid openings of a single crystal furnace at two points using a draft tube as a reference. Background technique [0002] In the process of Czochralski single crystal, it includes various common processes such as seeding, shouldering, shoulder turning, equal diameter, and finishing. Among them, the seeding, shouldering, and equal diameter all need to accurately control the distance between liquid ports, that is, The distance from the lower edge of the guide tube to the liquid surface of the molten silicon. At present, the image captured by the CCD camera is analyzed and calculated by the method of taking preset coefficients, that is, the image of the lower edge and reflection of the guide tube is captured by the CCD camera, and the ratio is introduced. ...

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Problems solved by technology

[0002] In the process of Czochralski single crystal, it includes various common processes such as seeding, shouldering, shoulder turning, equal diameter, and finishing. Among them, the seeding, shouldering, and equal diameter all need to accurately control the distance between liquid ports, that is, The distance from the lower edge of the guide tube to the liquid surface of the molten silicon. At present, the image captured by the CCD camera is analyzed and calculated by the method of taking preset coefficients, that is, the image of the lower edge and reflection of the guide tube is captured by the CCD camera, and the ratio is introduced. Coefficient, by multiplying the pixel distance and the coefficient, calculate the straight-line distance between the selected boundary point and the reflection point along the lower edge of the guide tube, and then calculate the liquid mouth distance. It is difficult to determine the coefficient of this method, and the selected boundary point is in the reflection It is extremely difficult to find the corresponding point of

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