Adsorption mechanism and adsorption system

An adsorption mechanism and adsorption zone technology, applied in the field of adsorption mechanism and adsorption system, can solve the problems of inability to realize large-angle rotation, complex control, complex structure, etc., and achieve the effects of simple and exquisite structure, simple use and assembly, and simple and lightweight structure.

Pending Publication Date: 2021-09-17
YINGUAN SEMICON TECH CO LTD
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  • Abstract
  • Description
  • Claims
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Problems solved by technology

This handover mechanism can complete the handover of silicon wafers, but the structure is relatively complicated, and it cannot

Method used

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  • Adsorption mechanism and adsorption system
  • Adsorption mechanism and adsorption system
  • Adsorption mechanism and adsorption system

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Embodiment Construction

[0043] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention more clear, various implementation modes of the present invention will be described in detail below in conjunction with the accompanying drawings. However, those of ordinary skill in the art can understand that, in each implementation manner of the present invention, many technical details are provided for readers to better understand the present application. However, even without these technical details and various changes and modifications based on the following implementation modes, the technical solution claimed in this application can also be realized.

[0044]In the following description, for the purposes of explaining the various disclosed embodiments, certain specific details are set forth in order to provide a thorough understanding of the various disclosed embodiments. One skilled in the relevant art will recognize, however, that an embodiment may be pr...

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Abstract

The invention discloses an adsorption mechanism and an adsorption system. In the invention, the adsorption mechanism comprises: a sucker, wherein the sucker is internally provided with a first air passage and a second air passage, the bottom of the sucker is provided with an air inlet hole communicated with the first air passage, and the sucker is also internally provided wiht an air passing channel which is communicated with the second air passage and penetrates through the top of the sucker; a handover device, wherein the handover device is arranged in the sucker, and the handover device is provided with a supporting rod which is used for being ejected out of the top of the sucker by gas when the gas is introduced into the first air passage; and a one-way control valve which is arranged in the sucker and is connected with the first air passage and the second air passage, wherein the one-way control valve is used for being closed when gas is introduced into the first air passage and is also used for being opened when the gas in the first air passage is pumped out. Compared with the prior art, the adsorption mechanism is simple and light in structure, small in overall size, free of cable interference in rotation and capable of achieving large-angle rotation.

Description

technical field [0001] The invention relates to the field of integrated circuit equipment manufacturing, in particular to an adsorption mechanism and an adsorption system. Background technique [0002] In semiconductor manufacturing process equipment, the adsorption device of the workpiece table needs to rotate at a large angle, and the suction cup of the workpiece table is required to complete the transfer of silicon wafers with the silicon wafer transmission system. Commonly used silicon wafer transfer mechanisms can be placed outside the workpiece table and inside the workpiece table. For the transfer mechanism currently placed outside the workbench, although it can realize the transfer of the silicon wafer and the moving table, it cannot rotate with the workpiece table at a large angle; the transfer mechanism placed inside the workpiece table can realize the transfer between the silicon wafer and the moving table. Handover, and large-angle rotation with the workpiece ta...

Claims

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Application Information

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IPC IPC(8): H01L21/683
CPCH01L21/6838
Inventor 吴火亮江旭初徐腾肖董亚聪
Owner YINGUAN SEMICON TECH CO LTD
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