Highly reflective nano-film and its preparation method and application
A nano-film, high-reflection technology, used in branch equipment, sputtering, instruments, etc., can solve the problems of easy electrical conductivity, weak adhesion, and color influence of metal-plated materials, and achieve good film adhesion and yield. High and efficient effect
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[0061] The present invention also provides a preparation method of a highly reflective nano film, comprising the following steps:
[0062] Deposit transition layer, first high-refractive index layer, first low-refractive-index layer, second high-refractive-index layer, second low-refractive-index layer, metal layer and third low-refractive-index layer sequentially on substrate to obtain high reflection nano film.
[0063] The coating method is not limited, and may be vapor deposition, magnetron sputtering, and the like.
[0064] Specifically, the preparation method of a typical highly reflective nano film comprises the following steps:
[0065] 1. Use an ultrasonic cleaner to clean ceramic, glass or gem (3D, 2.5D, flat sheet) substrates, use a protective film to paste and fix the front, and the back is the area to be coated;
[0066] 2. Put the tested substrate into the umbrella of the evaporator cavity and fix it with a magnet, close the door of the machine to pump air and ...
Embodiment 1
[0076] In this example, a 3D product of 152.22±0.08×73.94±0.08*0.6±0.02mm glass sheet is produced, and the preparation process of the highly reflective nano-film made of aluminum material is carried out according to the following specific process steps:
[0077] 1. Prepare high-gloss polished glass products. After cleaning with a fully automatic twelve-slot ultrasonic cleaning machine, paste the board and prepare for coating;
[0078] 2. Paste and fix the front side of the glass substrate with a protective film, and the back side is the area to be coated. The sprayed ink is black ink. After spraying, the ink meets the requirements of the resistance test;
[0079] 3. Put the pasted product into the umbrella of Guangchi 2350 evaporation coating machine and fix it with a magnet. The coating steps are as follows:
[0080] 3.1 Put the coating material silicon dioxide / titanium dioxide etc. into the crucible, close the door and vacuumize;
[0081] 3.2 Vacuum to 3.0×10 -3 After Pa, ...
Embodiment 2
[0104] The difference between embodiment 2 and embodiment 1 is that the thickness of each film layer is different: the first layer of silicon dioxide (SiO 2 ,15nm), the second layer of titanium dioxide (TiO 2 ,10nm), the third layer of silicon dioxide (SiO 2 ,75nm), the fourth layer of titanium dioxide (TiO 2 ,60nm), the fifth layer of silicon dioxide (SiO 2 ,60nm), the sixth layer of aluminum (Al,75nm), the seventh layer of silicon dioxide (SiO 2 ,40nm), the measured reflectance is 95.2%, and the color is light blue.
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