Measurement method of submillimeter trench structure based on white light interferometry and spgd
A technology of white light interference and measurement method, applied in the direction of measuring devices, optical devices, instruments, etc., can solve the problems of long time consumption, long time consumption, low efficiency, etc., and achieve the effect of simple optical path
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[0035] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.
[0036] The technical solution adopted in the present invention includes two parts, simulation and experiment, and the experiment and simulation verify each other, wherein the trench samples to be tested in the present invention are generally, for example, microelectronics and power semiconductor devices, but not limited thereto.
[0037] Such as figure 1 Shown, the present invention comprises the following steps:
[0038] 1) Build a white light interference system, such as figure 2As shown, it includes a light source, a beam splitter, a CCD camera, and a deformable mirror; the white light generated by the light source is incident on the beam splitter for transmission and reflection, and the transmitted light of the beam splitter is reflected by the deformable mirror and then incident back into the beam splitter, and then incident in...
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