Large-stroke two-dimensional nanometer positioning platform

A two-dimensional nanometer and positioning platform technology, which is applied in the direction of machines/supports, instruments, measuring devices, etc., can solve the problems of low positioning speed and large coupling between X and Y, and achieve easy and fast positioning, improve accuracy, and eliminate crossover coupling effect

Active Publication Date: 2021-11-30
HUAZHONG UNIV OF SCI & TECH
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] In view of the above defects or improvement needs of the prior art, the present invention provides a two-dimensional nano-positioning platform with a large stroke, thereby solving the technical problems of low positioning speed and large coupling between X and Y of the traditional large-stroke nano-positioning platform

Method used

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  • Large-stroke two-dimensional nanometer positioning platform
  • Large-stroke two-dimensional nanometer positioning platform
  • Large-stroke two-dimensional nanometer positioning platform

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Embodiment Construction

[0031] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other.

[0032] An embodiment of the present invention provides a two-dimensional nano-positioning platform with a large stroke, such as figure 1 As shown, it includes: a base 2, a motion platform 1 arranged in the center of the base, four drive slots 5 with the same structure and symmetrically arranged on the base with respect to the center of the motion platform, a rectangular lever amplifying unit 6 a...

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Abstract

The invention discloses a large-stroke two-dimensional nanometer positioning platform. The large-stroke two-dimensional nanometer positioning platform is characterized in that a plurality of rectangular lever amplification units with the same structure and sawtooth lever amplification units are arranged in a manner of being centrosymmetric about a motion platform, two stage motion displacement amplification units are adopted, rectangular amplification levers are used as the first-stage structure to amplify the displacement in the X direction and the Y direction, the sawtooth lever amplification units are used as the second-stage structure, secondary amplification is conducted on internal deformation of the rectangular lever amplification units, displacement is transmitted and decoupling is completed through tiny deformation of flexible hinges, and the positioning accuracy of the motion platform is greatly improved. Compared with traditional lever amplification units, the larger amplification ratio is achieved, and the large-stroke two-dimensional nanometer positioning platform is rapid and accurate in positioning, large in action stroke and capable of completing the two-dimensional plane track precise tracking task and can be used for designing a large-stroke image-level atomic force microscope.

Description

technical field [0001] The invention belongs to the field of precision positioning, and more specifically relates to a two-dimensional nanometer positioning platform with a large stroke. Background technique [0002] In recent years, my country's demand for self-developed high-end and precision instruments in the fields of biomedical engineering, semiconductors, nano-functional materials, and chip manufacturing has become increasingly urgent. High-speed and high-precision measuring instruments represented by Atomic Force Microscope (AFM) are an important part of high-end precision manufacturing, and the accuracy and performance of these high-precision instruments largely depend on the nanopositioning platform behind them The research and development of high-precision nano-positioning platform is of great significance to the research and development of high-precision measuring instruments. [0003] Nowadays, with the development of biomedical technology, people's requirement...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): F16M11/04F16M11/18F16M11/22F16F15/04G01Q60/24
CPCF16M11/045F16M11/048F16M11/18F16M11/22F16F15/04G01Q60/24
Inventor 张海涛张逸伦陈智勇王志岳易明磊
Owner HUAZHONG UNIV OF SCI & TECH
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