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Optical metasurfaces, and associated manufacturing methods and systems

A metasurface and optical technology, applied in the field of optical metasurface, which can solve problems such as difficulty in large-scale implementation

Inactive Publication Date: 2021-11-30
UNIV DAIX MARSEILLE +3
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This constraint makes the method difficult to implement on a large scale
As such, these techniques are often limited to laboratory demonstrations

Method used

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  • Optical metasurfaces, and associated manufacturing methods and systems
  • Optical metasurfaces, and associated manufacturing methods and systems
  • Optical metasurfaces, and associated manufacturing methods and systems

Examples

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Embodiment Construction

[0076] In the following detailed description, to ensure clarity of explanation, only some exemplary embodiments are described in detail, however, these examples are not intended to limit the general scope of the principles presented in this specification.

[0077] figure 1 Represents a diagram illustrating an example of a method 100 for fabricating an optical metasurface according to the present specification, figure 2 An example of an optical metasurface 200 according to the present specification is shown.

[0078] figure 1 The illustrated example of the method 100 for fabricating an optical metasurface includes a step 110 of obtaining a 2D array of nanostructures forming a dielectric element resonant in a given operating spectral band; The obtained 2D array is exposed 120 to a writing wave.

[0079] According to one example, step 110 includes performing a process on substrate 210 (see figure 2 ) is deposited 112 a layer of dielectric material sensitive to light in a gi...

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Abstract

The present invention concerns a method (100) for manufacturing an optical metasurface configured to operate in a given spectral band of use. The method comprises: obtaining (110) a 2D array (220) of patterns each comprising one or more nanostructures forming resonant dielectric elements (222) resonating in the spectral band of use, the nanostructures being formed in at least one photosensitive dielectric medium, the at least one photosensitive dielectric material having a refractive index that can be varied by exposing same to at least one electromagnetic writing wave having a wavelength within a photosensitivity spectral band; exposing (120) the 2D array to an electromagnetic writing wave having at least one wavelength within the photosensitivity spectral band, the writing wave having, in a plane of the 2D array, a spatial energy distribution that is a function of a desired phase profile such that, following the exposure, each pattern of the 2D array produces, on an incident electromagnetic wave having a wavelength within the spectral band of use, a phase variation corresponding to a variation in refractive index experienced by the pattern during the exposure.

Description

technical field [0001] The present invention relates to the field of optical metasurfaces, and more specifically, to the custom fabrication of dielectric optical metasurfaces. Background technique [0002] In order to steer light beams, and more generally, electromagnetic waves, conventional components such as prisms or lenses create a cumulative phase delay during propagation through the material from which they are formed. Thus, for eg a prism or a lens, the thickness traversed in a material with a given refractive index varies continuously in order to increase the optical path compared to propagation in air. Therefore, the optical function of a component is completely determined by its intrinsic properties such as shape and refractive index. [0003] Nanotechnology now makes it possible to design a new class of optical components called "optical metasurfaces," which consist of nanostructures such as nanopillars or other particles made of dielectric or 2D optical element...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00C03C23/00G02B1/12G02B5/18
CPCG02B1/002G02B1/12G02B5/1857C03C23/0025C03C3/321C03C2218/328C03C2218/34C03C17/02C03C17/23C03C17/32G02B2207/101G03F7/0005
Inventor 埃琳娜·米埃琳娜雷达·阿伯德达姆斯特凡·埃诺朱利安·卢莫伊万·沃兹纽克特里芬·安托那卡西
Owner UNIV DAIX MARSEILLE