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Radio frequency power supply control method and system applied to etching machine

A technology of radio frequency power supply and control method, which is applied in electrical program control, program control in sequence/logic controllers, etc., can solve the problems of high etching cost and low etching efficiency of etching machine, and achieve maximum and reduce noise. Interference, achieve the effect of RF power

Pending Publication Date: 2022-03-01
华科电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention provides a radio frequency power control method and system applied to an etching machine, which is used to solve the problem that the traditional radio frequency power control method is applied to an etching machine, requiring two radio frequency power supply modules, resulting in high etching cost of the etching machine and low etching efficiency. lower case

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  • Radio frequency power supply control method and system applied to etching machine
  • Radio frequency power supply control method and system applied to etching machine
  • Radio frequency power supply control method and system applied to etching machine

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Embodiment 1

[0069] as attached figure 1 Said, the present invention includes a kind of radio frequency power control method applied to etching machine, comprising:

[0070] Obtain etching information, determine the etching type of the object to be etched, and determine the etching requirement according to the etching type;

[0071] According to the etching requirements, a simulated etching model based on radio frequency power supply is established;

[0072] Determine the control scheme of the radio frequency power supply according to the simulated etching model, and control the radio frequency power supply to perform etching according to the control scheme;

[0073] The working principle of the above technical solution is: in the prior art of the present invention, applying the radio frequency power supply control method to the etching machine requires two radio frequency power supply modules, one of which supplies power to the coil assembly in the etching tank, and the other radio frequ...

Embodiment 2

[0076] In an embodiment of the present invention: said obtaining etching information, determining the etching type of the object to be etched, and determining the etching requirement according to the etching type, includes:

[0077] Acquiring etching information, determining basic parameters of the object to be etched, and determining retrieval information of the object to be etched according to the basic parameters;

[0078] Obtain the etching type and etching process of the object to be etched through the preset etching database according to the retrieval information;

[0079] Analyzing the etching type and etching process of the object to be etched to determine the etching requirements;

[0080] The working principle of the above-mentioned technical solution is: in the prior art of the present invention, when determining the etching demand of the object to be etched, the etching demand is determined by manual input, and it is necessary to wait for the input information befo...

Embodiment 3

[0083] In an embodiment of the present invention: according to the etching requirements, establishing a simulated etching model based on radio frequency power supply, including:

[0084] Obtain historical etching data, determine etching parameters, and use it as training set data;

[0085] Obtain the template etching parameters in the etching database, and use it as test set data;

[0086] Based on the test set data, the training set data is trained to generate a simulated etching model based on a radio frequency power supply.

[0087] The working principle of the above-mentioned technical solution is: in the prior art of the present invention, the application of the radio frequency power control method in the etching machine does not involve the collection and analysis of historical etching data, so there is no simulated etching model based on radio frequency power, which also Although the RF power control method is applied to the etching machine, the etching efficiency is n...

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Abstract

The invention provides a radio frequency power supply control method and system applied to an etching machine, and the method comprises the steps: obtaining etching information, determining the etching type of a to-be-etched object, and determining an etching demand according to the etching type; according to the etching demand, establishing a simulation etching model based on a radio frequency power supply; according to the simulated etching model, determining a control scheme of a radio frequency power supply, and according to the control scheme, controlling the radio frequency power supply and carrying out etching; the system comprises a demand determination module, a model generation module and a scheme output module. The radio frequency power supply control method is applied to the etching machine, so that the etching efficiency and the accuracy can be improved.

Description

technical field [0001] The invention relates to the technical field of radio frequency power control, in particular to a radio frequency power control method and system applied to an etching machine. Background technique [0002] At present, the RF power supply is composed of a drive circuit, a power amplifier circuit, an impedance matching circuit, a directional coupler, and a control system. The traditional RF power supply control method applied to an etching machine requires two RF power supply modules, one of which is used for the coil assembly in the etching tank. For power supply, another radio frequency power supply module etches the object to be etched by generating a self-bias, which leads to higher etching cost of the etching machine and lower etching efficiency. In the etching machine products of the prior art, such as the product model is XHL- 6M6024 vacuum etching machine, dimensions: 6024*2227*2700mm; power: 36KW; power supply: 380V / 50Hz, using two radio freque...

Claims

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Application Information

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IPC IPC(8): G05B19/04C23F1/08
CPCG05B19/04C23F1/08
Inventor 李佳
Owner 华科电子有限公司
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