Radio frequency power supply control method and system applied to etching machine

[0068] Example 1:

[0069] Append figure 1 The present invention includes a radio frequency power control method applied to an etching machine, including:

[0070] Get etching information, determine the etch type of the object to be etched, and determine the etching requirements according to the etch type;

[0071] According to the etching requirements, an analog etching model based on RF power is established;

[0072] According to the analog etching model, the control scheme of the RF power source is determined, and the radio frequency power supply is controlled according to the control scheme, etching;

[0073] The operation principle of the above technical solution is that the prior art of the present invention applies two RF power modules in an etching machine in the prior art of the present invention, one of which is powered by the coil assembly in the etching groove, and the other RF power module passes Generating self-biasing objects is etched, resulting in higher cost of etching machine etching, and low etching efficiency, the use of single-RF power supply methods to detect the etching object, solve the prior art use dual radio frequency power supply And by automatically detecting the type of the object to be etched, the etching needs are determined, and the control scheme of the RF power source is dynamically determined by establishing an analog etching model based on a radio frequency power source, and ultimately controlling the RF power supply to perform etching;

[0074] The beneficial effect of the above technical solution is that the present invention first uses the etching type of the object to be etched by automatically determining that the etching requirement is advantageous to automatically determine the etching scheme before etching, without manual participation, avoiding the occurrence of error rate, in addition, by establishing The simulated etching model of the RF power supply is established, which is advantageous to accurately etch the etching requirements of the object to be etched to avoid errors, increase the correctness of the etching.

[0075] Example 2:

[0076] In an embodiment of the invention: The acquisition etching information determines the etching type of the object to be etched, and determines etching requirements based on the etch type, including:

[0077] Get etching information, determines the basic parameters of the object to be etched, and determine the search information of the object to be etched according to the basic parameters;

[0078] According to the retrieval information, the etch type and etching flow of the object to be etched by the etching target are obtained by pre-set the etching database;

[0079] Analyze the etch type and etching flow of the object to be etched, determine the etching requirements;

[0080] The operation principle of the above technical solution is that the etching requirements are determined by manual input in the prior art of the present invention to determine the etching requirements of the object to be etched, and the input information is required before each etching, thus causing manual The mistake causes the error rate to rise and spend more time. In the present invention, by obtaining the basic information parameters of the object to be etched, the basic information parameters are integrated, generate search information, and generate retrieval information, and according to the retrieval information in the pre-set etching object database Automatic matching, obtain the specific etch type of the object to be etched, and finally analyze the type, determine the need for etching, solve the problem of artificially etching error rate due to manualization;

[0081] The advantageous effects of the above technical solution are: By acquiring the basic parameters of the object to be etched in the present invention, it is beneficial to improve the index efficiency, quickly find the target object information, and improve the etching Efficiency and the correct rate, by analyzing etching requirements by etching the etching type to analyze the etching requirements, facilitating the etching mode and requirements of the exact match to etching the object to avoid decrease in etching efficiency due to artificial mistakes.

[0082] Example 3:

[0083] In an embodiment of the invention: the anchor-based etching model based on the etching requirements, including:

[0084] Get historical etching data to determine the etching parameters, and act as training set data;

[0085] Get the template etch parameters in the etching database and as test set data;

[0086] Based on the test set data, the training set data is trained to generate an analog etching model based on RF power supply.

[0087] The operation principle of the above technical solution is that the prior art of the present invention is applied to the etching machine in the existing inventive machine to collect and analyze the historical etching data, so there is no analog etching model based on RF power supply. Although the radio frequency power control method is applied to the etching machine, the efficiency of etching is not improved, and when the RF power source is applied to the etching machine, the historical etching data is labeled and tracked, and the template in the etching database is etched. The parameters are trained and tracked, and the analog etching model based on RF power is established.

[0088] The beneficial effect of the above technical solution is: the history etching data is tracked in the present invention, and the historical etching data is trained based on the template etching parameters, generating an analog etching model based on the RF power source, which is advantageous to effectively utilize historical etching data to increase etching. The prediengest, in addition, establish an analog etching model based on RF power supplies facilitates more accurately designing an etching object to determine the efficiency and proper rate of etching.