Radio frequency power supply control method and system applied to etching machine
A technology of radio frequency power supply and control method, which is applied in electrical program control, program control in sequence/logic controllers, etc., can solve the problems of high etching cost and low etching efficiency of etching machine, and achieve maximum and reduce noise. Interference, achieve the effect of RF power
Pending Publication Date: 2022-03-01
华科电子有限公司
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Abstract
The invention provides a radio frequency power supply control method and system applied to an etching machine, and the method comprises the steps: obtaining etching information, determining the etching type of a to-be-etched object, and determining an etching demand according to the etching type; according to the etching demand, establishing a simulation etching model based on a radio frequency power supply; according to the simulated etching model, determining a control scheme of a radio frequency power supply, and according to the control scheme, controlling the radio frequency power supply and carrying out etching; the system comprises a demand determination module, a model generation module and a scheme output module. The radio frequency power supply control method is applied to the etching machine, so that the etching efficiency and the accuracy can be improved.
Application Domain
Programme control in sequence/logic controllers
Technology Topic
Computational physicsRadio frequency +2
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