Array substrate, manufacturing method of array substrate and display panel
A manufacturing method and technology of transparent electrodes, which are applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve problems such as lower production efficiency, higher production costs, and complex manufacturing processes, so as to reduce production costs and improve production Efficiency, the effect of reducing the amount of use
Pending Publication Date: 2022-04-12
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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Problems solved by technology
Among them, the 6-layer process requires two photomask processes to manufacture the semiconductor layer and transparent electrode of the thin film transistor when making the semiconductor layer and transparent electrode of the thin film transistor, resulting in the need for more photomasks and more complex processes. The production process increases the production cost and reduces the production efficiency
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[0073] Next, the technical scheme in the present application embodiment will be described in the present application embodiment, and it is understood that the described embodiments are merely the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, those skilled in the art do not have all other embodiments obtained by creative labor, all of the present application protected.
[0074] In the description of this application, it is to be understood that the terms "center", "length", "width", "upper", "lower", "front", "post", "left", "right", " The orientation or position of the inside "," outside ", etc. is based on the orientation or positional relationship shown in the drawings, which is only to facilitate the description of the present application and simplified description, rather than indicating or implying that the device or component must have a specific The orientation is constructed and operated in a specif...
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The invention discloses an array substrate, a manufacturing method of the array substrate and a display panel, and the manufacturing method of the array substrate comprises the steps: providing a substrate, and forming a gate electrode on the substrate; forming a first insulating layer on the gate electrode; forming a conductive channel, a transparent electrode, a source electrode and a drain electrode on the first insulating layer; wherein the conductive channel and the transparent electrode are formed by a transparent metal oxide semiconductor layer in the same layer through one-time photoetching patterning. According to the array substrate, the conductive channel and the transparent electrode are arranged on the same layer, and the conductive channel and the transparent electrode are formed by the transparent metal oxide semiconductor layer in the same layer through one-time photoetching patterning, so that the use number of photomasks during manufacturing of the array substrate is reduced, the manufacturing cost is reduced, and the production efficiency is improved.
Description
Technical field [0001] The present application relates to the field of display, and more particularly to a method of manufacturing an array substrate, an array substrate, and a display panel. Background technique [0002] Existing liquid crystal displays typically include a liquid crystal display panel and a backlight module. The liquid crystal display panel is usually composed of a color film substrate, a thin film transistor array substrate, and a liquid crystal layer disposed between the two substrates. The working principle is to control the liquid crystal molecules of the liquid crystal layer by applying a drive voltage, and the backlight mold The rays of the group reflects the generating screen. According to the alignment method of the liquid crystal, the liquid crystal display panel in the mainstream market can be divided into the following types: vertical alignment, twisted to the column or super distorted column type, planar conversion type, and edge field switch type. ...
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IPC IPC(8): H01L21/77H01L27/12
Inventor 吴伟
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD