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Dilute solution manufacturing device

A technology for manufacturing devices and dilute solutions, which is applied in the direction of pump devices, semiconductor/solid-state device manufacturing, and parts of pumping devices for elastic fluids. It can solve problems such as pump blockage and quantitative discharge, and achieve stable supply.

Pending Publication Date: 2022-04-12
KURITA WATER INDUSTRIES LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In particular, pumps with extremely low flow rates are prone to clogging due to air bubbles, and when air bubbles accumulate, they cannot be discharged quantitatively by the pump

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] use figure 1 The dilute solution manufacturing device shown uses pump 6 to send 29% NH from tank 4 3 The solution was added to the ultrapure water in the pipe 1 flowing at 60 L / min to prepare a solution with an electrical conductivity of 3 μS / cm. The sensor 11 used is a conductivity meter. When the conductivity drops 5% from the set value, the degassing valve 9 is opened for 5 seconds to degas, and then the degassing valve 9 is closed to return to the normal state. The test continued for 30 days, and the conductivity detected by the conductivity meter 11 did not decrease by more than 10% from the set value.

Embodiment 2

[0038] In addition to adding 29% NH in such a way that the conductivity is 1500 μS / cm 3 Except for the solution, it was operated in the same manner as in Example 1. The test continued for 30 days, and the conductivity detected by the conductivity meter 11 did not decrease by more than 10% from the set value.

Embodiment 3

[0040] It operated in the same manner as in Example 1 except that the flow rate of ultrapure water was 3 L / min. The test continued for 30 days, and the conductivity detected by the conductivity meter 11 did not decrease by more than 10% from the set value.

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Abstract

The present invention provides a dilute solution production device capable of stably producing a dilute solution having a predetermined concentration by adding a small amount of a second liquid containing a conductivity imparting substance or a redox potential adjusting substance to a first liquid such as ultrapure water. A dilute solution production device for producing a dilute solution of a second liquid by adding the second liquid containing a conductivity imparting substance and / or a redox potential adjusting substance to a first liquid, the dilute solution production device being provided with: a first pipe (1) through which the first liquid flows; a pump (6) for adding the second liquid into the first pipe (1) via a second pipe (5); a degassing pipe (8) for degassing from the pump (6); the water quality sensor (11) is composed of a conductivity meter, a resistivity meter or a redox potentiometer; and a control device (12) that opens the degassing valve (9) when the water quality detection value of the water quality sensor (11) varies by a predetermined value or more.

Description

technical field [0001] The present invention relates to a dilute solution production apparatus for producing a dilute solution of the substance by adding a small amount of a second liquid containing a conductivity-imparting substance or a redox potential adjusting substance to a first liquid such as ultrapure water. Background technique [0002] As a washing solution used in wafer processing in the electronics industry field, a solution obtained by adding a conductivity-imparting substance and an oxidation-reduction potential adjusting substance to ultrapure water is used. [0003] At this time, a conductivity-imparting substance and an oxidation-reduction potential adjusting substance were added to ultrapure water using a pump (Patent Documents 1 and 2). [0004] When the conductivity-imparting substance or the oxidation-reduction potential adjusting substance is a substance that is easily vaporized, bubbles of the substance tend to accumulate in the pump. In particular, p...

Claims

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Application Information

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IPC IPC(8): B01F23/40B01D19/00
CPCC02F1/68H01L21/304F04B53/06F04B23/00C02F2209/05C02F2103/04C02F1/20C02F2209/04C02F2209/40C02F1/008C02F2209/005C02F1/686
Inventor 小川祐一
Owner KURITA WATER INDUSTRIES LTD
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