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Elliptic polarization measurement system based on synchronous reference light correction

A measurement system and ellipsometric technology, which is applied in the field of optical measurement, can solve problems such as stability affecting the stability of the whole machine system, achieve real-time correction of light source intensity fluctuations, ultra-high stability, and improve measurement stability.

Pending Publication Date: 2022-05-03
RAINTREE SCI INSTR SHANGHAI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the ellipsometry system, the signal collected by the detector or spectrometer will be affected by the stability of the light source, so the stability of the light source will directly affect the stability of the whole system

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  • Elliptic polarization measurement system based on synchronous reference light correction
  • Elliptic polarization measurement system based on synchronous reference light correction
  • Elliptic polarization measurement system based on synchronous reference light correction

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Embodiment Construction

[0017] The invention will now be described in more detail with reference to the accompanying drawings, in which preferred embodiments of the invention are shown, it being understood that those skilled in the art may modify the invention described herein and still achieve the advantageous effects of the invention. Therefore, the following description should be understood as the broad knowledge of those skilled in the art, but not as a limitation of the present invention.

[0018] Specific structural and functional details disclosed herein are representative only and are for purposes of describing example embodiments of the present application. This application may, however, be embodied in many alternative forms and should not be construed as limited to only the embodiments set forth herein.

[0019] It will be understood that although the terms "first", "second", etc. may be used herein to describe various elements, these elements should not be limited by these terms. These te...

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Abstract

The invention provides an ellipsometry system based on synchronous reference light correction, in the system, an optical splitter is arranged behind a polarizer, the optical splitter can split linearly polarized light emitted by the polarizer into measuring light and reference light in different directions, the reference light is irradiated to a second detector, and the measuring light is irradiated to the second detector. The measuring light is reflected by a sample to be detected along the direction of an incident light beam and is finally captured by the first detector, and the processor can collect and process the light intensity synchronously measured by the first detector and the second detector. Therefore, the reference light can be used for effectively correcting the intensity fluctuation of the light source in real time, and the measurement stability of the system is improved, so that the ellipsometry system with ultrahigh stability is realized.

Description

technical field [0001] The present application relates to the field of optical measurement, in particular to an ellipsometry system based on synchronous reference light correction. Background technique [0002] The semiconductor VLSI manufacturing process involves different types of thin film deposition, etching, etc., all of which require high-precision, high-stability measurement of thickness, optical constants, critical dimensions and other information. Generally, non-contact and high-efficiency polarization optical means are often used. Accurate and stable measurement system can guarantee the yield rate of mass production. [0003] In the field of optical measurement in the prior art integrated circuit industry, an ellipsometer capable of resolving polarized light is often used for dimension measurement and calibration of wafer microstructures. In the ellipsometry system, the signal collected by the detector or spectrometer will be affected by the stability of the ligh...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B11/00G01B11/02G01B11/06H01L21/67
CPCG01B11/00G01B11/02G01B11/06G01B11/0641H01L21/67
Inventor 牛晓海黄建华尚振华姚岭邱青菊吴博文吕彤欣
Owner RAINTREE SCI INSTR SHANGHAI