Linear motion platform

Abstract

The invention relates to a linear motion table which comprises a linear actuator, an annular outer ring, an annular inner ring and a plate spring, the annular outer ring and the annular inner ring are coaxially arranged, the plate spring is fixedly connected between the annular outer ring and the annular inner ring, and the linear actuator is arranged on the inner side of the annular inner ring and fixedly connected with a base table. One of the annular outer ring and the annular inner ring is fixedly connected with the base table, the other one is connected with the load table top, and a moving shaft of the linear actuator is connected with the load table top. The linear motion platform is compact in structure and small in size, the anti-interference performance of the motion platform on inertia force can be improved, and meanwhile the working stability and reliability of the linear motion platform are improved.

Description

technical field [0001] The invention relates to the technical field of precise positioning control, in particular to a linear motion table. Background technique [0002] When testing products, in order to ensure the accuracy of detection, according to different working conditions, the measured object can be precisely positioned through the linear motion stage, or the XY motion stage and the Z-direction motion stage set on the XY motion stage can be used for precise positioning. Precise positioning of the object to be measured, and the need for specific working conditions, as well as the introduction of RZ to the moving table to adjust the position of the object to be measured. For different product types, the requirements for the working accuracy of the motion table are also different. When testing semiconductor wafers, due to the precision of its own structure, the detection accuracy requirements are also higher, even reaching the micron or even nanometer level. . [0003...

AI Technical Summary

Problems solved by technology

[0003] As far as the Z-direction linear motion table is concerned, voice coil motors are mostly used as the driving components at present, but the entire Z-direction motion table will have problems of low control bandwidth, high heat generation, and strong magnetic field, which will affect the scanning of the electron microscope. It will also affect the scanning rate of the objective lens during semiconductor wafer inspection. At the same time, the generation of large heat will also cause thermal deformation of the inspected semiconductor wafer, which will affect the product yield.

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