Rotary base device and semiconductor process equipment

Abstract

The invention provides a rotating base device and semiconductor process equipment, the rotating base device is applied to a process chamber of the semiconductor equipment, the rotating base device comprises a base assembly, at least two magnetic rotating parts and at least two groups of magnetic driving assemblies, the base assembly is arranged in the process chamber and is used for bearing a wafer; the magnetic rotating piece is connected with the base assembly; the magnetic driving assemblies are fixedly arranged outside the process chamber, the magnetic rotating parts and the magnetic driving assemblies are uniformly distributed in the circumferential direction of the base assembly, each group of magnetic driving assemblies comprises two magnetic driving parts, the magnetic driving parts can drive the magnetic rotating parts to rotate through magnetic coupling, and then the magnetic rotating parts drive the base assembly to rotate around the axes of the magnetic rotating parts. According to the rotary base device and the semiconductor process equipment provided by the invention, the levelness and concentricity of wafer rotation can be improved, and the process result is improved.

Description

technical field [0001] The present invention relates to the technical field of semiconductor equipment, and in particular, to a rotary base device and semiconductor process equipment. Background technique [0002] In the silicon epitaxial growth process, the rotation of the susceptor carrying the wafer in the process chamber has an impact on the thickness and resistivity uniformity of the epitaxial layer grown on the wafer. Concentricity during spinning is critical to the process outcome of the silicon epitaxial growth process. [0003] like figure 1 As shown, a rotary base device in the prior art includes a base 11, a rotary lift drive member 12, a rotary drive member and a lift drive member, the base 11 is used to carry the wafer 9, and the rotary lift drive member 12 rotates The transmission member is connected with the base 11 and is connected with the lift transmission member. During the process, the rotary lift drive member 12 drives the lift drive member to rise an...

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Problems solved by technology

[0004] However, in order to accurately control the levelness of the base 11 in the existing rotating base device, there are relatively high requirements for the installation between the base 11, the rotating and lifting driving part 12 and the rotating transmission part, and the rotating transmission part The rotating shaft 13 in the center is easily deformed when heated, causing the wafer 9 to easily swing (up and down and / or left and right) when rotating, which affects the horizontality of the rotation of the wafer 9 and affects the process results.

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