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Multi-faceted mirror for illumination optical unit of projection exposure apparatus

A faceted mirror and optical unit technology, used in projection exposure equipment, manufacturing microstructure components or nanostructure components, can solve the problem of not protecting the facets, and achieve the effect of improving protection

Pending Publication Date: 2022-07-08
CARL ZEISS SMT GMBH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this mechanism does not protect the facets during normal operation of the facet mirror

Method used

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  • Multi-faceted mirror for illumination optical unit of projection exposure apparatus
  • Multi-faceted mirror for illumination optical unit of projection exposure apparatus
  • Multi-faceted mirror for illumination optical unit of projection exposure apparatus

Examples

Experimental program
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Embodiment Construction

[0117] Below, first refer to figure 1 The general structure and beam path in the projection exposure apparatus 1 are described.

[0118] The projection exposure apparatus 1 comprises an illumination optical unit 1 a for illuminating an object field 2 in an object plane 3 with illumination radiation 4 . The projection exposure apparatus 1 also includes a figure 1 Projection optics unit 1b for imaging a reticle, not shown in , which is arranged in the region of the object plane 3 and has structures to be imaged on a wafer, which is likewise not shown in the figure 1 and is arranged in the image plane 31 . Details are known from the prior art.

[0119] The illumination radiation 4 may in particular be EUV radiation, in particular illumination radiation having a wavelength of at most 30 nm, in particular 13.5 nm or less.

[0120] Illumination radiation 4 is generated by a radiation source 5 . A plasma source or a free electron laser (FEL) can be used, for example, as the radi...

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PUM

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Abstract

A multi-faceted mirror for an illumination optical unit of a projection printing system has a plurality of displaceable individual facets (8i) having a facet body (35) and a reflective surface (36) equipped thereon, at least one sub-combination of the individual facets (8i) having a displacement range, the sub-combination is in contact with the abutment surface (38) in one or more displacement positions.

Description

[0001] This patent application claims priority from the German patent application DE 10 2019 214 269.9, the content of which is hereby incorporated by reference. technical field [0002] The present invention relates to a facet mirror for an illumination optical unit of a projection exposure apparatus. The invention also relates to individual facets of a facet mirror for an illumination optical unit of a projection exposure apparatus. The invention also relates to an illumination optical unit, an illumination system, an optical system and a projection exposure apparatus with corresponding facet mirrors. Finally, the invention relates to a method for producing a microstructured part or a nanostructured part, and also to a part produced according to this method. Background technique [0003] Facet mirrors for illumination optical units of projection exposure apparatuses having a large number of displaceable individual facets are known from the prior art. In this case, separa...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70075G03F7/70116G03F7/70983G02B26/0833G03F7/702
Inventor W.安德尔C.科纳H.奥尔德雷M.霍尔兹M.斯通皮S.塞茨
Owner CARL ZEISS SMT GMBH