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Videograph processing devices

A processing device and a processing liquid technology, applied in the direction of spraying devices, spraying devices, devices for coating liquid on the surface, etc., can solve the problems of reduced uniformity in the plane, inconsistent image quality, substrate damage, etc., and achieve good Image quality, the effect of fast and efficient image processing

Inactive Publication Date: 2006-04-19
TOKYO ELECTRON LTD
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  • Claims
  • Application Information

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Problems solved by technology

The larger the time difference (T), the more inconsistent the image quality on the substrate, and there is a problem that the in-plane uniformity decreases
[0006] In response to this problem, a method of increasing the conveying speed V was developed in the past. However, in the advection method, the conveying speed V is limited, and when the conveying speed is high, the possibility of damage to the substrate during conveying is greater. This is not an effective solution

Method used

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Examples

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Embodiment Construction

[0038] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.

[0039] figure 1Shows a coating image processing system suitable for use in the image processing apparatus of the present invention. The coating and developing processing system 10 is set in a clean room, for example, the LCD substrate is used as the substrate to be processed, and the cleaning, resist coating, pre-baking, and developing in the photolithography process are carried out in the LCD manufacturing process. Various treatments such as elephant and post-baking. Exposure processing is performed by an external exposure device 12 provided adjacent to the system.

[0040] The coating and development processing system 10 is provided with a horizontal processing station (P / S) 16 at the center and is provided with a cassette station (C / S) 14 and an interface station (I) at both ends of the longitudinal direction (X direction). / F) 18.

[0041] Cassette sta...

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Abstract

To carry out development processing effectively in a short time, while carrying a processing substrate on a carrying path laid in the horizontal direction. A development unit(DEV) 94 is formed, by arranging a plurality of modules M1 to M8, which form a carry path 108 extending along a process line B continuously in a single line. The module M1 among the modules M1 to M8, which is positioned at the uppermost end, constitutes a substrate carry-in part 110. The four modules M2, M3, M4, M5, which follow it, constitute a development part 112, the next module M6 constitutes a rinse part 114, the next module M7 constitutes a drying part 116, and the last module M8 constitutes a substrate carry-out part 118. A pre-wet part 124, a developer supply part 126 and the rinse part 114 are provided with a prewetting liquid supply nozzle PN, which is movable in both directions along the carrying path 108 with its nozzle discharge port facing the carry path 108, a developer supply nozzle DN and a rinse liquid supply nozzle RN, respectively.

Description

technical field [0001] The present invention relates to a development processing device which performs a series of development processing steps while conveying a substrate to be processed horizontally. Background technique [0002] Recently, in the resist coating and development processing system for LCD (liquid crystal display) production, as a development method advantageously corresponding to the increase in the size of the LCD substrate, the substrate composed of conveying rollers and conveyor belts is laid in the horizontal direction. On the transport path, the so-called advection method, which carries out a series of developing processes such as developing, rinsing, and drying while transporting the LCD substrate, has attracted people's attention. Compared with the rotary method that rotates the substrate, this advection method has a simpler configuration of the substrate handling, transport system, and drive system, and has the advantages of less smoke generation and ...

Claims

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Application Information

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IPC IPC(8): G02F1/133B05C5/00G03F7/30B05B1/00H01L21/027H01L21/31
CPCB24B3/06B24B41/005B24B41/02
Inventor 宫崎一仁佐田彻也
Owner TOKYO ELECTRON LTD
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