Driving apparatus, exposuring apparatus and device producing method
A technology of driving device and driving force, which is applied in the direction of photolithographic exposure device, semiconductor/solid-state device manufacturing, microlithography exposure equipment, etc., and can solve the problems of increasing the area occupied by the device and the area occupied by the device.
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[0031] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.
[0032] Figure 4A , 4B These are a plan view and a cross-sectional view respectively showing a wafer stage of an exposure apparatus according to a preferred embodiment of the present invention in which the stator of the actuator is used as a reaction force balance body receiving the driving reaction force of the mover.
[0033] exist Figure 4A and4B Among them, a wafer chuck 31 and strip mirrors 50 and 51 for position measurement are provided on the top plate 30 . The wafer chuck 31 vacuum-suctions and holds a wafer to be positioned. The strip mirrors 50 and 51 reflect measurement light from a laser interferometer not shown in the figure. The top plate 30 floats in a non-contact manner with respect to the XY slide plate 38 by a self-weight compensating unit (not shown) using a magnet. There are degrees of freedom in 6 axis directions. In addition,...
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