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Driving apparatus, exposuring apparatus and device producing method

A technology of driving device and driving force, which is applied in the direction of photolithographic exposure device, semiconductor/solid-state device manufacturing, microlithography exposure equipment, etc., and can solve the problems of increasing the area occupied by the device and the area occupied by the device.

Inactive Publication Date: 2003-11-05
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] In addition, the increase in the size of the equipment is also becoming more and more serious, and the problem of increasing the occupied installation area in the manufacturing factory where a large number of manufacturing equipment is installed is becoming more and more serious.
That is to say, if the vibration transmitted from the device to the foundation bed is large, in order to prevent other devices from being affected by the vibration, the distance between the devices must be increased, and as a result, the actual area occupied by each device will increase.

Method used

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  • Driving apparatus, exposuring apparatus and device producing method
  • Driving apparatus, exposuring apparatus and device producing method
  • Driving apparatus, exposuring apparatus and device producing method

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Embodiment Construction

[0031] Preferred embodiments of the present invention will be described below with reference to the accompanying drawings.

[0032] Figure 4A , 4B These are a plan view and a cross-sectional view respectively showing a wafer stage of an exposure apparatus according to a preferred embodiment of the present invention in which the stator of the actuator is used as a reaction force balance body receiving the driving reaction force of the mover.

[0033] exist Figure 4A and4B Among them, a wafer chuck 31 and strip mirrors 50 and 51 for position measurement are provided on the top plate 30 . The wafer chuck 31 vacuum-suctions and holds a wafer to be positioned. The strip mirrors 50 and 51 reflect measurement light from a laser interferometer not shown in the figure. The top plate 30 floats in a non-contact manner with respect to the XY slide plate 38 by a self-weight compensating unit (not shown) using a magnet. There are degrees of freedom in 6 axis directions. In addition,...

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PUM

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Abstract

The object of the present invention is to counteract or reduce the influence of the moment reaction forces accompanying the actuation of the body. The driving device of the present invention includes a first actuator for driving an object (XY slide, etc.) in the X direction, a second actuator for driving the object in the Y direction, and a control unit for controlling the first and second actuators. The first and second actuators each have a reaction balance body that moves upon receiving a reaction force when the object is driven. The control unit controls the first and second actuators to move the upper body which is stationary at point A to stationary at point B, so that the object moves on a straight line connecting point A and point B.

Description

technical field [0001] The present invention relates to a driving device, an exposure device and a device manufacturing method, such as a driving device for moving an object along a guide surface in the X direction and the Y direction, an exposure device incorporating the driving device, and a device manufacturing method using the exposure device . Background technique [0002] As a typical exposure device used in the manufacture of devices such as semiconductor devices, a substrate (substrate) (for example, a wafer or a glass substrate) is moved step by step, and the original plate (reduced plate) is projected by the projection optical system. or mask) patterns are projected on multiple exposure areas on the substrate and sequentially transferred step-and-repeat exposure device (also known as a step projection exposure machine) and the original pattern by repeated step movement and scanning exposure A step-and-scan type exposure device (also known as a scanning projection ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/22G03F7/20H01L21/027
CPCG03F7/70725G03F7/70758G03F7/70766G03F7/20
Inventor 関口浩之
Owner CANON KK