Lifting/lowering type substrate proless device and substrate process system having same

A substrate processing device and lift-type technology, which is applied in the directions of optics, instruments, electrical components, etc., can solve the problems of processing liquid, container enlargement, surface dry spots, etc., and achieve the effect of high-precision control and easy speed control
CN1484279AInactive Publication Date: 2004-03-24SUMITOMO PRECISION PROD CO LTD
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Patent Information

Authority / Receiving Office
CN Β· China
Current Assignee / Owner
SUMITOMO PRECISION PROD CO LTD
Publication Date
2004-03-24
Estimated Expiration
Not applicable Β· inactive patent

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Abstract

The substrate treatment apparatus 10 includes a housing shape cover 11 having a substrate input port 11a and a substrate discharge port 11b provided in parallel in a vertical direction, and a treatment mechanism 20 mounted in the cover 11. The apparatus 10 further includes the treatment mechanism 20 having a conveying / supporting means for receiving and supporting the substrate conveyed from the input port 11a and discharging the substrate from the port 11b, a support substrate 21 for supporting the conveying / supporting means, a substrate inclining means for inclining the substrate supported by the conveying / supporting means, and a treatment fluid discharge means arranged above the substrate / supporting means to discharge a treatment fluid on the substrate inclined by the substrate inclining means, and a lifting means 40 for supporting the treatment mechanism 20, lifting the treatment mechanism 20 in a vertical direction and making the treatment mechanism 20 pass via the port 11a and the port 11b.
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Description

technical field

[0001] The present invention relates to a processing device and multi-connection device for performing predetermined processing on various substrates such as semiconductor (silicon) wafers, liquid crystal glass substrates, glass substrates for photomasks, substrates for optical discs, etc., while moving (transporting) them. A substrate processing system composed of a processing device. Background technique

[0002] For example, in the manufacturing process of liquid crystal glass substrates, wet processing of coating of developing solution, coating of etchant, and coating of stripping liquid for stripping resist film is carried out, and cleaning is performed during each wet processing. Net treatment and dry treatment.

[0003] In addition, as a processing apparatus used for each of the above-mentioned processings, a processing apparatus configured in such a manner that a substrate is placed on a conveying roller and passed through the conveying roller while ...

Claims

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