Image forming method and device, manufacture of device, conductive film layout, photoelectric device and electronic machine
A technology for optoelectronic devices and conductive films, which is used in semiconductor/solid-state device manufacturing, conductive pattern formation, and discharge tube/lamp manufacturing. The effect of forming motion, smooth pattern formation, and suppressing failure
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 [Formation method of figure]
Next, the pattern forming method of the present invention will be described with reference to the drawings. figure 1 It is a flowchart showing an embodiment of the pattern forming method of the present invention.
 Here, in this embodiment mode, a case where a conductive film wiring pattern is formed on a substrate will be described as an example.
 figure 1 Among them, the pattern forming method according to this embodiment includes: a step of cleaning the substrate on which droplets of the liquid material are placed using a predetermined solvent or the like (step S1); a lyophobic treatment step (step S2) constituting a part of the substrate surface treatment step; adjusting A lyophobic reduction treatment step (step S3) that constitutes a part of the surface treatment process to lyophobicize the surface of the substrate after the lyophobic treatment; disposing the wiring including the conductive film on the surface ...
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