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Supporting plate, stage device, exposure apparatus and exposure method

A technology of exposure device and exposure method, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc.

Inactive Publication Date: 2011-03-30
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0012] From this it can be seen that the above-mentioned existing fixed plate, stage device, exposure device and exposure method obviously still have inconvenience and problems in structure, method and use. deficiencies, and urgently need to be further improved
In order to solve the problems existing in the fixing plate, the stage device, the exposure device and the exposure method, the relevant manufacturers have tried their best to find a solution, but no suitable design has been developed for a long time, and the general products have not been suitable. A cut structure can solve the above problems, which is obviously a problem that the relevant industry is eager to solve

Method used

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  • Supporting plate, stage device, exposure apparatus and exposure method
  • Supporting plate, stage device, exposure apparatus and exposure method
  • Supporting plate, stage device, exposure apparatus and exposure method

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Embodiment Construction

[0115] In order to further explain the technical means and effects that the present invention adopts to achieve the intended invention purpose, below in conjunction with the accompanying drawings and preferred embodiments, the specifics of the fixing plate, the stage device, the exposure device and the exposure method proposed according to the present invention will be described below. Embodiments, structures, methods, steps, features and effects thereof are described in detail below.

[0116] Below, see Figures 1 through Figure 12 As shown, embodiments of the platen, the stage device, the exposure device and the exposure method of the present invention will be described.

[0117] (first embodiment)

[0118] In the first embodiment, the fixed plate of the present invention and the stage device equipped with the fixed plate will be described.

[0119] Please refer to FIG. 1 , which is a schematic configuration diagram of an embodiment of the stage device of the present inven...

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Abstract

The present invention relates to a supporting plate, stage device, exposure apparatus and exposure method, capable of restraining the infection of the leakage and immersion of liquid for exposure, and implementing favorable exposure process. The supporting plate (41) is arranged with supporting surface (41A) for supporting object. The device ensures the supporting plate (41) to be able to supplying liquid and is arranged with a recovering device (71) for recovering liquid.

Description

technical field [0001] The present invention relates to a fixed disk, an object stage device, an exposure device and an exposure method, in particular to a fixed disk, an object mounted object suitable for exposing a substrate on the object stage through a projection optical system and liquid. A stage device, an exposure device, and an exposure method. Background technique [0002] Semiconductor elements and liquid crystal display elements are manufactured by so-called photolithography, which transfers a pattern formed on a mask to a photosensitive substrate. The exposure apparatus used in the photolithography process has a mask stage for supporting the mask and a substrate stage for supporting the substrate, and the mask stage and the substrate stage are sequentially moved, and The pattern of the mask is transferred to the substrate through the projection optical system. In recent years, projection optical systems have been required to have higher image resolution in orde...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/027G12B9/00G03F7/20
CPCG03F7/70716G03F7/70341G03F7/707G03F7/7095
Inventor 荒井大
Owner NIKON CORP
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