Method and apparatus for measurement, and method and apparatus for exposure

Abstract

An object is to provide a measuring method and a measuring apparatus having excellent working efficiency, which can measure an optional substance contained in a predetermined gas accurately and promptly, and an exposure method and an exposure apparatus. An exposure apparatus S comprises; a measuring section M capable of measuring an absorptive substance, a gas supply unit N which can supply a gas GS in an optical path space LS to the measuring section M, a clean gas supply unit H which can supply a clean gas GT2 in which the absorptive substance has been reduced, to the measuring section M, and a switchover device B which can switch the supply of the gas GS and the clean gas GT2, to the measuring section M. Measurement of the concentration of the absorptive substance contained in the gas GS is performed accurately in a state where the residual absorptive substance in the measuring section M is reduced.

Description

technical field [0001] The present invention relates to a measurement method and a measurement device for measuring an arbitrary substance contained in a predetermined gas, and an exposure method and an exposure device. [0002] This application is based on Japanese Patent Application (Japanese Patent Application No. 2000-99650), and the content thereof is incorporated into this specification. Background technique [0003] Conventionally, when manufacturing semiconductor elements, thin-film magnetic heads, liquid crystal display elements, etc. by photolithography steps, various exposure apparatuses have been used. This exposure device projects an image of a pattern formed on a photomask or a grid (hereinafter referred to as "mask") to a substrate coated with a photosensitive agent such as photoresist on the surface through a projection optical system. In recent years, along with the miniaturization of the shape of the pattern of the projection area projected on the substrat...

AI Technical Summary

Problems solved by technology

As mentioned above, in the state where oxygen remains in the measuring device, the measured value is higher than the real value, so even if the optical path space is quickly purged with an inert gas and the real oxygen concentration is reduced to a low concentration of several ppm or less, The measuring device also shows the measurement result of high concentration, so the measurement result cannot be confirmed with high accuracy

Therefore, it is impossible to measure the concentration of light-absorbing substances in the optical path space with high precision, and not only the overall work efficiency of the exposure process is reduced, but also expensive purge gas is wasted, resulting in an increase in cost.

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