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Wave front aberration measuring device

A technology for measuring device and wave aberration, which is applied in the direction of measuring device, optical device, optical instrument test, etc., can solve the problems of high cost and high cost

Inactive Publication Date: 2005-12-07
OLYMPUS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Among them, even if the cost of one interferometer is quite high, if more than one is to be prepared, it will cost a lot

Method used

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  • Wave front aberration measuring device

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Embodiment Construction

[0017] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.

[0018] figure 1 It is a configuration diagram of a wave aberration measuring device. The illumination system 1 can selectively output laser beams of arbitrary wavelengths respectively different from each other. The wavelength of the laser beam is, for example, a wavelength of 0.633 μm or any wavelength in the wavelength range from UV to NIR. The selection of the laser beam output from the illumination system 1 is performed manually or automatically by switching control of the wave aberration analysis device 2 described later. A laser beam 3 output from this illumination system 1 is guided to a Tyman-Green interferometer (hereinafter simply referred to as an interferometer) 4 .

[0019] figure 2 It is a configuration diagram of an example of the lighting system 1 . exist figure 2 , among two or more (for example, n types) of wavelengths, let one wavelength be λ...

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Abstract

A wave front aberration measuring device, wherein laser beam sources (1-1, 1-2) outputting laser beams with wavelengths of (lambda1, lambdai) are installed in a lighting system (1), and either of the laser beam sources (1-1, 1-2) is selected according to the wavelengths (lambda1, lambdai) of an inspected optical system (8) analyzing wave front aberration. In a wave front aberration analyzing device (2), the wave front aberration of the inspected optical system (8) is analyzed based on the wavelengths (lambda1, lambdai) of the laser beam selected by the lighting system (1) and interference fringe image data.

Description

technical field [0001] The present invention relates to a wave aberration measuring device for measuring wave aberration of a test optical system such as a lens. Background technique [0002] For example, there is a method of evaluating optical performance, such as transmission performance, of an optical system to be inspected, such as an objective lens of a microscope. In this method, for example, coherent light such as a laser beam is transmitted through the optical system to be inspected, and an interferometer is used to cause interference between the object light and the reference light transmitted through the optical system to be inspected to generate a plurality of interference fringes with different phases. According to the analysis of the interference fringes The wave aberration of the optical system under test. A method for measuring such a wave aberration is disclosed in, for example, Japanese Patent Application Laid-Open No. 10-96679. [0003] The phase differen...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/02G01B11/24G01M11/02
CPCG01B11/2441G01M11/0271
Inventor 江田幸夫
Owner OLYMPUS CORP