Base plate processing device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- DAINIPPON SCREEN MTG CO LTD
- Publication Date
- 2006-03-01
Smart Images
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Abstract
Description
technical field
[0001] The present invention relates to a technique of a substrate processing apparatus that applies a processing liquid to a surface of a substrate by scanning the substrate while ejecting the processing liquid from a nozzle. More specifically, it relates to a technique for detecting a target object with high accuracy in order to prevent the nozzle from interfering with a foreign object (object) during scanning using a nozzle. Background technique
[0002] In the manufacturing process of glass square substrates for liquid crystals, semiconductor wafers, flexible substrates for thin-film liquid crystals, substrates for photomasks, substrates for color filters (hereinafter simply referred to as "substrates"), etc., the process of applying a treatment liquid to the surface of the substrate is used. Coating equipment (substrate processing equipment). As a coating device, there are known a slit coater that performs slit coating using a slit nozzle having a slit-...