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Coaxial low-temp plasma material processor

A low-temperature plasma, coaxial technology, applied in the direction of plasma, chemical/physical/physicochemical processes of energy application, electrical components, etc., can solve problems such as glass breakage and gas leakage

Inactive Publication Date: 2006-09-13
INST OF ELECTRICAL ENG CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to overcome the disadvantages of glass breakage or gas leakage in the prior art, and provide a low-temperature plasma material processor that can satisfy the visibility of the discharge state and prevent the leakage of the discharge working gas

Method used

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Embodiment Construction

[0011] The present invention is composed of a coaxial integrated discharge and material processing cavity, an inner electrode 11, an outer electrode 9, a water circulation cooling system, an air cooling system 12, and the like.

[0012] The coaxial integrated discharge and material processing cavity is made of glass material as a whole, and the glass material can be heat-resistant glass such as quartz glass. Such as figure 1 As shown, the discharge and material processing chamber is composed of an outer tube 1, an inner tube 2, an air inlet (material) chamber 3, an air inlet (material) nozzle 4, an air outlet (material) chamber 5 and an air outlet (material) nozzle 6. The inner tube 2 has a uniform wall thickness of 1-5 mm, an inner diameter of 3-20 mm, and the tube length can be determined according to actual needs. The outer tube 1 has a uniform wall thickness of 1-5 mm, an inner diameter of 5-50 mm, and the tube length can be determined according to actual needs. The cyli...

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Abstract

A coaxial low temperature plasma material processor includes a coaxial integrated discharge and material process cavity, an inner electrode, an outer electrode, a water circulation cooling system and a wind cooling system and the discharge and material process cavity is composed of an inner tube and an outer tube and the column centers are coincident, the outside of the outer tube covers the outer electrode and the internal electrode passes through the inner tube, nozzles for inputting and outputting the working gas and materials to be processed are distributed along the circles at both ends of the cavity, which utilizes mediums to block discharge and generates low temperature plasma in a coaxial processor cavity to input particles or gas to be processed and discharged after being processed by low temperature plasma in the cavity.

Description

technical field [0001] The invention relates to a low-temperature plasma material processor, in particular to a coaxial low-temperature plasma material processor. Background technique [0002] The principle of dielectric barrier discharge is an important low-temperature plasma generation mechanism, which suppresses the discharge current and prevents the discharge form from turning to arc discharge by covering any electrode of the cathode and anode with a solid dielectric or placing a solid dielectric between the anode and cathode electrodes. Generate low temperature plasma. Low-temperature plasma with large volume and uniform discharge is required in surface treatment engineering such as nano-powder surface treatment. Dielectric barrier discharge can discharge in the form of glow discharge or glow discharge at an atmospheric pressure or low pressure, and generate low-temperature plasma uniformly distributed in space. Atmospheric pressure dielectric barrier discharge has be...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H05H1/42B01J19/08
Inventor 袁伟群严萍
Owner INST OF ELECTRICAL ENG CHINESE ACAD OF SCI