Production of anti-CD20 intrinsic antibody and its use

A chimeric antibody, a new type of technology, applied in the direction of antibodies, anti-animal/human immunoglobulins, fusion cells, etc., to achieve moderate molecular weight, good clinical application prospects, and good stability.
CN1896229AInactive Publication Date: 2007-01-17BEIJING MABWORKS BIOTECH

Patent Information

Authority / Receiving Office
CN Β· China
Current Assignee / Owner
BEIJING MABWORKS BIOTECH
Publication Date
2007-01-17
Estimated Expiration
Not applicable Β· inactive patent

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

Production of CD20 chimeric antibody and its use are disclosed. The process is based on preparation of anti-human CD20 single-cloning antibody hybridoma cell 1-28 and its antibody gene. It has cognitive epitope characteristic and mediated killer target cell functions.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to a novel monoclonal antibody specifically targeting CD20 (named 1-28), which has the functions of recognizing CD20 molecules, inhibiting the growth of CD20 positive cells, and specifically killing target cells through CDC; Good prospects for clinical application.

[0002] The present invention relates to a novel humanized mouse monoclonal antibody method: the variable region of the antibody is ScFv; the constant region is the Fc segment of IgG, that is, the CH2 domain and CH3 domain of the antibody; the variable region and the constant region are connected through the hinge region of the antibody; Under natural conditions, the cysteine ​​in the hinge region forms a disulfide bond and dimerizes into a bivalent structure. The anti-CD20 humanized antibody TGS achieved by this method greatly reduces the murine origin of mAb 1-28, while maintaining good antigen recognition activity and CDC function, and improves the clinical applicati...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More