Photoetching machine table, developing apparatus and developing process thereof

Abstract

The invention supplies developing unit and method. The unit includes one platform, one base plate has exposed photoresist layer, and one fluid injector injected the developer to the base plate at the first time to develop the exposed photoresist and injected one fluid to the base plate at the second time to clean it. Thus it can process pre-cleaning and pre-developing for the photoresist to avoid the under developing. The critical dimension of the processed whole base plate tends to consistent. This can greatly improve developing technology yield.

Description

technical field [0001] This invention relates to photolithographic processes, and more particularly to apparatus used in the developing step. Background technique [0002] Photolithography is the most important process in the manufacture of electronic components. How to copy the layout that can be recognized by human eyes to components with micron-nanometer circuits depends on the quality of the photolithography process. The photolithography process generally includes the following steps: substrate cleaning, coating photoresist, soft bake), exposure, development, and subsequent processes such as hard bake, ion implantation, ion treatment or etching, removal Photoresist. In order to obtain a better photolithographic effect, the photoresist manufacturing method is improved according to the existing technology, the exposure process of the stepper is improved, and a different exposure light source is even selected. [0003] Most of the improvements still focus on the photores...

AI Technical Summary

Problems solved by technology

Since more than one photolithography process is usually required to manufacture a circuit structure on the substrate 10, the problem of inconsistent critical dimensions caused by the steps of FIG. 1B and FIG. 1C will continue to accumulate.

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