High-breakdown voltage semiconductor switching device and switched mode power supply apparatus using the same
A technology of switching elements and semiconductors, which is applied in the direction of semiconductor devices, output power conversion devices, electrical components, etc., and can solve the problems of large conduction loss, reduction loss, and large switching loss
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no. 1 example
[0093] Hereinafter, a horizontal high withstand voltage semiconductor switching element and a switching power supply device using the horizontal high withstand voltage semiconductor switching element according to a first embodiment of the present invention will be described with reference to the drawings.
[0094] Figure 1 to Figure 3 , respectively are diagrams showing an example of the structure of the high withstand voltage semiconductor switching element of this embodiment, figure 2 is a floor plan; figure 1 is along figure 2 Sectional view of line A-A' in image 3 is along figure 2 Sectional view of line B-B' in . To add, in figure 2 In , the illustration of some structural factors is omitted.
[0095] exist Figure 1 to Figure 3 In the high withstand voltage semiconductor switching element of the present embodiment shown, the concentration is, for example, 1×10 14 / cm 3 left and right P - type semiconductor substrate 201 surface portion, formed with conce...
no. 2 example
[0126] Next, a horizontal high withstand voltage semiconductor switching element and a switching power supply device using the horizontal high withstand voltage semiconductor switching element according to a second embodiment of the present invention will be described with reference to the drawings.
[0127] Figure 10 , is a cross-sectional view showing an example of the structure of the high withstand voltage semiconductor switching element of this embodiment. Such as Figure 10 As shown, in the high withstand voltage semiconductor switching element of this embodiment and figure 1 The first embodiment shown differs in that it includes internally provided with a concentration of eg 1 x 10 16 / cm 3 The N-type RESURF region 217 of the left and right p-type semiconductor layers 216 replaces the RESURF region 202 of the first embodiment. It should be added that the p-type semiconductor layer 216 is formed in the portion (the surface portion of the RESURF region 217) that is ...
no. 3 example
[0131] Next, a horizontal high withstand voltage semiconductor switching element and a switching power supply device using the horizontal high withstand voltage semiconductor switching element according to a third embodiment of the present invention will be described with reference to the drawings.
[0132] Figure 11 , is a cross-sectional view showing an example of the structure of the high withstand voltage semiconductor switching element of this embodiment. Such as Figure 11 As shown, in the high withstand voltage semiconductor switching element of this embodiment and Figure 10 The second embodiment shown differs by including a concentration at a deeper location such as 1 x 10 16 / cm 3 The N-type RESURF regions 222 of the left and right p-type semiconductor layers 221 replace the RESURF regions 217 of the second embodiment. Specifically, the p-type semiconductor layer 221 is formed at a deeper position than the p-type semiconductor layer 216 in the resurf region 217 ...
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