MOSFET with lateral resistor ballasting
Patent Information
- Authority / Receiving Office
- US ยท United States
- Patent Type
- Applications(United States)
- Current Assignee / Owner
- INT BUSINESS MASCH CORP
- Publication Date
- 2001-10-18
- Estimated Expiration
- Not applicable ยท inactive patent
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Abstract
Description
[0001] 1. Field of the Invention
[0002] The present invention generally relates to high density integrated circuits and, more particularly, to regulating performance and conduction characteristics of MOSFET devices included therein.
[0003] 2. Description of the Prior Art
[0004] The enhancements to performance and economy of manufacture derived from high density integration of semiconductor integrated circuits have been recognized for several years. During this same period of time, field effect transistor (FET) technology has generally become the technology of choice for all but the most critical of applications in view of scalability of field effect transistors to small sizes consistent with conduction requirements and other properties facilitating process economy, integration density and high manufacturing yield as well as exhibiting good operating margins and low drive current requirements. field effect transistors function as switching device by using a field developed by a voltage ...