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Cleaning apparatus

a technology of cleaning apparatus and cleaning equipment, which is applied in the direction of cleaning equipment, lighting and heating equipment, cleaning using liquids, etc., can solve the problems of difficult control of dry ice generation, unstable cosub>2/sub>, and the cleaning apparatus is difficult to control

Inactive Publication Date: 2005-07-28
FUJI ELECTRIC DEVICE TECH CO
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0008] In view of the problems described above, an object of the present invention is to provide a cleaning apparatus capable of cleaning while reducing dusts, and preventing dew condensation of an object to be cleaned due to CO2 sprayed thereto and condensation of CO2 within a pipe.
[0010] To attain the objects described above, according to a first aspect of the invention, a cleaning apparatus cleans an object to be cleaned by ejecting a cleaning agent from a nozzle, and includes gas ejecting means for ejecting heated gas to a surface of the object to be cleaned. The ejecting means is configured to move to a position above the object to be cleaned when cleaning is performed, and retract from the object to be cleaned when cleaning is not performed. An ejection quantity of the heated gas is controlled when cleaning is performed and when cleaning is not performed.

Problems solved by technology

However, the cleaning apparatus described above has the problems as follows.
As a result, it is difficult to control generation of dry ice.
To avoid this, the infrared heater 21 controls the temperature, but the generation of CO2 may become unstable since the temperature of the nozzle 18 is not independently controlled.

Method used

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Embodiment Construction

[0029] Hereunder, embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a view showing a structure of an essential part of a cleaning apparatus according to an embodiment of the present invention. In FIG. 1, an area A enclosed by a phantom line is a environmental chamber, in which a heat insulting material (not shown) prevents heat exchange with outside. The environmental chamber A contains a heater block 4, a filter 3, and a supporting member 2. Reference numeral 1 denotes pipes as gas ejecting means having closed one ends and the other ends fixed to the supporting member (manifold) 2. As shown in FIG. 1, each of the pipes 1 is disposed between a center and a periphery of an object 19 to be cleaned. It is preferred that four pipes 1 are provided on both sides of the object 19 to be cleaned for preventing dew condensation on the object 19 to be cleaned. However, one pipe 1 may be provided as far as dew condensation ca...

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Abstract

A cleaning apparatus cleans an object to be cleaned by ejecting a cleaning agent from a nozzle. The cleaning apparatus includes a gas ejecting device for ejecting heated gas to a surface of the object to be cleaned. The gas ejecting device is configured to move to a position above the object to be cleaned when cleaning is performed, and retract from the object to be cleaned when cleaning is not performed. An ejection quantity of the heated gas is controlled when cleaning is performed and when cleaning is not performed.

Description

BACKGROUND OF THE INVENTION AND RELATED ART STATEMENT [0001] The present invention relates to a cleaning apparatus for cleaning and removing fine particles or organic substances on a surface of a hard disk medium, a silicon wafer, or the like. [0002] It is necessary to completely clean a surface of a hard disk medium, a silicon wafer, or a glass plate of a liquid crystal display to remove fine particles or organic substances, so that irregularities of the surface is minimized and micromachining is applied. [0003] An example of a cleaning apparatus for cleaning a surface of a silicon wafer or the like has been disclosed in Japanese Patent Publication (Kokai) No. 2003-1208. FIG. 5 is a view showing a structure of the cleaning apparatus disclosed in the publication. In FIG. 5, reference numeral 11 denotes a cylinder of CO2 as a cleaning agent (hereinafter referred to as solvent), and CO2 within the cylinder 11 is divided into a liquid portion 111 with a temperature T and a gas portion ...

Claims

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Application Information

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IPC IPC(8): G11B5/84A47L5/14B08B3/00B08B5/00B08B5/02B08B7/00B08B7/02B08B7/04B24C1/00G11B23/50H01L21/00H01L21/304
CPCB08B5/02B08B7/0021H01L21/67051B24C1/003B08B7/02
Inventor YOSHIDA, TAKASHIKIKUCHI, OSAYASUIWASAKI, MOTOAKIHABAYA, KURAOYANO, TATSUROSHIROMA, TAKAHIRO
Owner FUJI ELECTRIC DEVICE TECH CO